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Magnesium Oxide Films as Temperature Sensor

机译:氧化镁膜作为温度传感器

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摘要

Mg oxide thin films, with thermal sensitivity superior to Pt thin films; were fabricated through annealing of Mg films deposited by r.f. magnetron sputtering. The annealing was carried out in the temperature range of 500-700 °C under atmospheric conditions. Resistivity of the resulting Mg oxide films were in the range of 1.7x10~7 μΩ-cm/°C to 2.81X10~(12) uΩ-cm/°C, depending on the extent of Mg oxidation. The temperature coefficient of resistance (TCR) of the MgO films also depended on the extent of Mg oxidation: The average TCR of MgO resistors, measured between 0 and 2'00°C; were 7630x10~2ppm/°C for the 500°C and 2988x102ppm/°C for 650 °C respectively. Because of their high resistivity and linear TCR, MgO thin films are superior to pure Pt thin films for flow and temperature sensor applications.
机译:氧化镁薄膜,热敏性优于铂薄膜;通过对r.f.磁控溅射。退火在大气条件下在500-700℃的温度范围内进行。取决于Mg氧化程度,所得Mg氧化膜的电阻率在1.7×10〜7μΩ·cm /℃至2.81×10〜(12)uΩ·cm /℃的范围内。 MgO膜的电阻温度系数(TCR)也取决于Mg氧化程度:MgO电阻的平均TCR,在0至2'00°C之间测量; 500°C分别为7630x10〜2ppm /°C和650°C为2988x102ppm /°C。由于其高电阻率和线性TCR,MgO薄膜在流量和温度传感器应用中优于纯Pt薄膜。

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