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ELECTRODEPOSITION AND CHARACTERISATION OF THIN MAGNETIC Ni-Fe FILMS ON COPPER SUBSTRATES

机译:铜基薄膜上薄磁性Ni-Fe薄膜的电沉积和表征

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In the present work, conditions for the Ni-Fe alloy electrodeposition on polycrystalline copper substrates from weakly acid sulphate-citrate electrolytes have been developed. Total and partial polarization curves for the deposition of nickel and iron separately as well as for their codeposition under controlled hydrodynamic conditions were determined. It has been established that Ni-Fe deposition process is mainly controlled by the mass transfer of the Fe(II) species towards the electrode. The chemical composition of such electrochemically produced films varies with their thickness, which significantly affects their physical properties. The change in coercive force of films as a function of thickness has been investigated and discussed, taking into account the influence of the chemical composition gradient of Ni-Fe alloy.
机译:在目前的工作中,已经开发了由弱酸性硫酸盐-柠檬酸盐电解质在多晶铜基板上电沉积Ni-Fe合金的条件。确定了分别沉积镍和铁以及在受控流体力学条件下共沉积的总极化曲线和部分极化曲线。已经确定,Ni-Fe沉积过程主要由Fe(II)物质向电极的质量转移控制。这种电化学生产的膜的化学组成随其厚度而变化,这显着影响其物理性能。考虑到镍铁合金化学成分梯度的影响,已经研究并讨论了薄膜矫顽力随厚度的变化。

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