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首页> 外文期刊>Annali di Chimica: Journal of Analytical and Environmental Chemistry >Effects of the Mercury ion Concentration on the Preparation of Mercury Deposits on Platinum Micro-Disk Electrodes
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Effects of the Mercury ion Concentration on the Preparation of Mercury Deposits on Platinum Micro-Disk Electrodes

机译:汞离子浓度对铂微盘电极上汞沉积物制备​​的影响

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In this paper, the effect of mercury ion concentration on the preparation of mercurymicroelectrodes fabricated on a platinum microdisk of 10 #mu#m radius was studied. The preparation of the mercury microelectrodes was followed by chronoamperometry, and the measurements were performed in Hg_2( NO_3)_2 solutions with concentrations over the range 0.1-0.25 mM. The mercury microelectrode size was referred to as h/a, where h is the height of the mercury deposit and a is the radius of the inlaid microdisk. The mercury microelectrodes investigated had h/a values over the range 0 - 2. The results obtained indicated that from concentrated mercury ion solutions (> 0.5 mM) the mercury growth was somehow erratic due to the coalescence of small mercury droplets. On the other hand, from dilute solutions (< 0.5 mM), the mercury deposits new smoothly. Under the latter conditions the geometric coefficient k, which characterises the steady state diffusion limiting current expression at a mercury microelectrode, was determined with good accuracy (within 5% error) from the chronoamperometric curves recorded during the mercury microelectrode preparation. In general, the coefficient k was calculated from theoretical expressions derived for a sphere cap and spheroidal geometry, which may model the shape of the mercury deposits. The comparison between theoretical and experimental k values suggested that both geometries equally modelled the experimental mercury deposit obtained. Finally, for the sphere cap geometry an algebraic expression relating k and h/a was derived fro an easier k evaluation from experimental h/a values.
机译:本文研究了汞离子浓度对在半径为10μm的铂微盘上制备的汞微电极制备的影响。汞微电极的制备通过计时安培法进行,并且在浓度范围为0.1-0.25mM的Hg_2(NO_3)_2溶液中进行测量。汞微电极的尺寸称为h / a,其中h是汞沉积的高度,而a是镶嵌微盘的半径。所研究的汞微电极的h / a值在0-2范围内。所得结果表明,从浓汞离子溶液(> 0.5 mM)开始,由于小汞滴的聚结,汞的生长有些不稳定。另一方面,从稀溶液(<0.5 mM)开始,汞会顺利沉积。在后一种条件下,由汞微电极制备过程中记录的计时电流曲线以良好的精度(误差在5%以内)确定了表征汞微电极稳态扩散极限电流表达式的几何系数k。通常,系数k是根据为球帽和球体几何形状得出的理论表达式计算得出的,可以对汞沉积物的形状进行建模。理论值与实验值k的比较表明,两种几何形状均等地模拟了获得的实验汞沉积。最后,对于球帽几何形状,可以从实验h / a值进行更容易的k评估,得出与k和h / a相关的代数表达式。

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