A Centrifugal-Force-Assisted Wet-Etching Approach toward Top-Down Fabrication of Perovskite-Single-Crystalline Thin Films

摘要

Organic-inorganic hybrid halide perovskite-single-crystalline thin films with high quality are promising for making highperformance optoelectronic devices,but their fabrication is still challenging,particularly for the top-down fabrication.Here,a facile centrifugal-force-assisted wet-etching strategy is used in fabricating hybrid perovskite-single-crystalline thin film from its single-crystalline wafer.The film thickness can be reduced to less than 20 micrometres and the film remains high quality and flat surface.Besides,this method can be used to regenerate surface-metamorphic perovskite single crystals.The present technique may provide an effective strategy for single-crystalline thin film preparation for demanding device applications and it is expected that this strategy would promise highefficient utilization of perovskite single crystals.