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Preparation of Fluorine-Free and Superhydrophobic SiO2 Film with High Transmittance

机译:具有高透射率的无氟和超疏水SiO2膜的制备

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摘要

Superhydrophobic film has broad application prospect in daily life. Herein, superhydrophobic SiO2 film was prepared with chemical modification reducing the film’s surface energy and sol mixing increasing its surface roughness. Tetraethoxysilane (TEOS) was used as precursor, trimethylethoxysilane (TMES) was used as modifier. Both the modified SiO2 film and the mixed SiO2 film were obtained with dip-coating. With the increase of TMES addition, the characteristic peak intensity of hydrophilic hydroxyl group in Fourier transform infrared spectrum (FTIR) decreased, and that of the hydrophobic methyl group increased; the modified SiO2 film surface was relatively smooth and its root-mean-square (RMS) roughness ranged 1.86-5.41 nm, while that of the mixed SiO2 film increased from 11.20 nm to 42.60 nm; the contact angle of the modified SiO2 film increased from 19.08° to 127.37°, while that of the mixed SiO2 film increased from 129.47° to 158.47°; the average transmittance of the modified SiO2 film first decreased from 94.86% to 94.14% and then increased to 94.43%, while that of the mixed SiO2 film decreased gradually from 96.99% to 94.84%. Finally, the fluorine-free superhydrophobic SiO2 film with the average contact angle of 158.47° and the average transmittance of 94.84% was obtained.
机译:超疏水膜在日常生活中具有广泛的应用前景。在此,用化学修饰制备了超疏水SiO2膜,以减少膜的表面能量和SOL混合,从而增加其表面粗糙度。将四甲氧基硅烷(TEOS)用作前体,将三甲基乙氧基硅烷(TME)用作修饰符。修改后的SiO2膜和混合的SiO2膜都是通过浸入涂层获得的。随着TMES添加的增加,傅立叶转化红外光谱(FTIR)中亲水性羟基的特征峰强度减少,疏水甲基的特征强度降低。修饰的SiO2膜表面相对光滑,其根平方(RMS)粗糙度为1.86-5.41 nm,而混合SiO2膜的粗糙度从11.20 nm增加到42.60 nm;修饰的SiO2膜的接触角从19.08°增加到127.37°,而混合SiO2膜的接触角从129.47°增加到158.47°;修改后的SIO2膜的平均透射率首先从94.86%降至94.14%,然后增加到94.43%,而混合SIO2膜的平均透射率从96.99%逐渐下降到94.84%。最后,获得平均接触角为158.47°,平均透射率为94.84%的无氟超疏水SIO2膜。

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