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Silicon substrate effects on ionic current blockade in solid-state nanopores

机译:硅底物对固态纳米孔中离子电流阻滞的影响

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摘要

We investigated the roles of silicon substrate material compositions in ionic current blockade in solid-state nanopores. When detecting single nanoparticles using an ionic current in a Si3N4 nanopore supported on a doped silicon wafer, resistive pulses were found to be blunted significantly via signal retardation due to predominant contributions of large capacitance at the ultrathin membrane. Unexpectedly, in contrast, changing the substrate material to non-doped silicon led to the sharpening of the spike-like signal feature, suggesting a better temporal resolution of the cross-channel ionic current measurements by virtue of the thick intrinsic semiconductor layer that served to diminish the net chip capacitance. The present results suggest the importance of the choice of Si compositions regarding the capacitance effects to attain better spatiotemporal resolution in solid-state nanopore sensors.
机译:我们研究了硅底物材料组成在固态纳米孔中离子电流阻断中的作用。 当使用掺杂的硅晶片支持的SI3N4纳米孔中使用离子电流检测单纳米颗粒时,由于超层膜上大型自位含量的主要贡献,由于信号延迟,有电阻脉冲被显着钝化。 相反,出乎意料的是,将底物材料更改为非掺杂硅导致了尖峰样信号特征的锐化,这表明通过厚厚的内在半导体层的跨通道离子电流测量更好地分辨率,该分辨率用于厚实的内在半导体层。 减小净芯片电容。 目前的结果表明,选择Si组成在电容效应方面的重要性,以在固态纳米孔传感器中获得更好的时空分辨率。

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