首页> 外文期刊>Optik: Zeitschrift fur Licht- und Elektronenoptik: = Journal for Light-and Electronoptic >Thermo-optic effects mediated self focusing mechanism and optical power limiting studies of ZnO thin films deposited on ITO coated PET substrates by RF magnetron sputtering under continuous wave laser regime
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Thermo-optic effects mediated self focusing mechanism and optical power limiting studies of ZnO thin films deposited on ITO coated PET substrates by RF magnetron sputtering under continuous wave laser regime

机译:热光学效应介导的ZnO薄膜沉积在ITO涂层PET基板上的自聚焦机理和光学功率限制研究通过RF磁控溅射在连续波激光状态下溅射

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摘要

In this work, ZnO thin films are deposited on ITO coated PET substrates employing RF magnetron sputtering technique. The evolution of crystallites orientation on (002) plane with increasing thickness of the films is unveiled from XRD patterns. Further, the appearance of (103) plane in the highest thickness film (183 nm) is attributed to the formation of surface layer during sputtering process. The smooth and homogenous natures of the films are displayed by the interference pattern in transmittance spectra. The presence of defect level emission in the luminescence spectra is ascribed to compressive stress in the films. The exhibition of orange-red emission confirms the excess oxygen in the sputtered films (89 nm and 183 nm). The dominance of thickness on the third-order nonlinear optical parameters is revealed by single beam Z-scan measurements. The lower thickness ZnO film (42 nm) shows an interesting self focusing behavior under closed aperture Z-scan measurements. A transition from self focusing to self defocusing behavior is noticed with increasing thickness values from 42 nm to 183 nm. The self focusing property is attributed to the combination of presence of large dipole moments at the substratefilm interface as result of large energy gap gradients and thermo-optic effects.
机译:本文采用射频磁控溅射技术在ITO涂层PET衬底上制备了ZnO薄膜。XRD图谱揭示了(002)面上晶粒取向随薄膜厚度增加的演变规律。此外,在最高厚度薄膜(183nm)中(103)平面的出现归因于溅射过程中表面层的形成。透射光谱中的干涉图样显示了薄膜的光滑和均匀性。发光光谱中缺陷能级发射的存在归因于薄膜中的压应力。橙红色发射的展示证实了溅射薄膜(89nm和183nm)中的过量氧气。单光束Z扫描测量揭示了厚度对三阶非线性光学参数的主导作用。在闭孔Z扫描测量下,较低厚度的ZnO薄膜(42 nm)显示出有趣的自聚焦行为。随着厚度值从42 nm增加到183 nm,观察到从自聚焦到自散焦的转变。这种自聚焦特性是由于大的能隙梯度和热光效应在衬底-薄膜界面上产生了大的偶极矩。

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