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Development and Application of Electron Tomography at Atomic Resolution

机译:电子断层扫描在原子分辨率下的开发与应用

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摘要

In this article, we introduce an atomic resolution tomography method using electron holography reconstructed from Cs corrected electron microscope. This method is allowed for quantitative analysis of three-dimensional atomic structure and surface topography from only one projected direction. Recently, TEM has capability to analyze material with sub-A resolution with a Cs corrector. However, the real structure in three dimensions (3D) and the whole shape of material still can not be directly revealed from electron micrographs due to the limitation of two dimensional projected image. Certainly, materials properties can be corrected with the atomic arrangement in three dimensions. The ultimate goal of electron microscopy is to act as a communication channel between structure and properties of materials. It is therefore a very important issue how to determine the atomic positions in three dimensions from two dimensional projected images. We demonstrated our methodology using the simulated exit wave functions of a bilayer graphene, oleic acid molecules and experimental cases including of Ge nano-crystal, MgO and nano Au bridge.
机译:在这篇文章中,我们介绍了一种原子分辨率层析成像方法,使用电子全息图从Cs校正电子显微镜重建。这种方法只允许从一个投影方向定量分析三维原子结构和表面形貌。最近,TEM能够用Cs校正器以亚A分辨率分析材料。然而,由于二维投影图像的限制,电子显微照片仍然无法直接显示材料的真实三维结构和整体形状。当然,材料的性质可以通过三维原子排列来修正。电子显微镜的最终目标是充当材料结构和性能之间的沟通渠道。因此,如何从二维投影图像中确定原子在三维中的位置是一个非常重要的问题。我们使用双层石墨烯、油酸分子的模拟出射波函数和实验案例(包括Ge纳米晶体、MgO和纳米金桥)演示了我们的方法。

著录项

  • 来源
    《科儀新知》 |2017年第212期|共12页
  • 作者

    Liu-Gu Chen; Fu-Rong Chen;

  • 作者单位

    Department of Engineering and System Science at National Tsing Hua University;

    Department of Engineering and System Science at National Tsing Hua University;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 仪器、仪表;
  • 关键词

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