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Microfabricated array of iridium microdisks as a substrate for direct determination of Cu2+ or Hg2+ using square-wave anodic stripping voltammetry

机译:使用方波阳极溶出伏安法直接测定铱微盘阵列作为基底,直接测定Cu2 +或Hg2 +

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In this paper, we report for the first time the characterization and separate electrochemical determinations of Cu2+ and Hg2+ directly on a microlithographically fabricated array of iridium ultramicroelectrodes (Ir-UMEA). Square-wave anodic stripping voltammetry was used to optimize experimental parameters such as supporting electrolyte, square-wave frequency, and deposition time and potential. Reproducible stripping peaks were obtained for solutions containing low parts per billion (ppb) concentrations of either metal. Excellent linearity was obtained for Cu2+ in the 20-100 ppb range and for Hg2+ in the 1-10 ppb range when the bare iridium substrate was used. Detection limits were calculated to be 1 ppb (0.1 M KNO3 and 0.1 M HClO4, deposition time 180 s) and 5 ppb (0.1 M H2SO4, deposition time 120 s) for Cu2+ (S/N = 3) and 85 ppt for Hg2+ (deposition time 600 s). The experimental detection limits were determined to be 5 ppb for Cu2+ (deposition time 180 s) and 100 ppt for Hg2+ (deposition time 600 s). Interference studies were performed, and it was determined that Pb, Zn, and Cd had little or no influence on the copper signal. Tap water and spring water samples were analyzed for copper, and good agreement was obtained with conventional methods. An unexplained effect of chloride ions on the iridium surface was noted. Further investigation;by atomic force microscopy determined that changes on the surface occurred but could be eliminated when chloride leakage from the reference electrode was minimized. The solid state construction of the Ir-UMEA makes it a prime candidate for use in determining Cu(II) and Hg(II) in chemically harsh environments. [References: 28]
机译:在本文中,我们首次报道了直接在铱超微电极(Ir-UMEA)的微光刻阵列上进行的Cu2 +和Hg2 +的表征和单独的电化学测定。方波阳极溶出伏安法用于优化实验参数,例如支持电解质,方波频率以及沉积时间和电势。对于含有低浓度的十亿分之一(ppb)两种金属的溶液,获得了可再现的溶出峰。使用裸铱基板时,Cu2 +的线性范围为20-100 ppb,Hg2 +的线性范围为1-10 ppb。 Cu2 +(S / N = 3)的检出限经计算为1 ppb(0.1 M KNO3和0.1 M HClO4,沉积时间180 s)和5 ppb(0.1 M H2SO4,沉积时间120 s)和Hg2 +(85 ppt沉积时间600 s)。 Cu2 +的实验检测极限确定为5 ppb(沉积时间为180 s),Hg2 +的实验检测极限为100 ppt(沉积时间为600 s)。进行了干扰研究,确定了Pb,Zn和Cd对铜信号的影响很小或没有。对自来水和泉水样品中的铜进行了分析,并与常规方法获得了良好的一致性。注意到氯离子对铱表面产生无法解释的影响。进一步的研究;通过原子力显微镜确定表面发生了变化,但是当氯从参比电极的泄漏最小化时可以消除。 Ir-UMEA的固态构造使其成为在化学条件恶劣的环境中测定Cu(II)和Hg(II)的主要候选对象。 [参考:28]

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