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首页> 外文期刊>Journal of Electronic Materials >Whisker Growth in Sn Coatings: A Review of Current Status and Future Prospects
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Whisker Growth in Sn Coatings: A Review of Current Status and Future Prospects

机译:SN涂层的晶须增长:对现状和未来前景的审查

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摘要

Whiskering is a spontaneous filamentary growth of material, and it is a major long-term reliability issue affecting microelectronic packages comprising Sn plating and Sn-rich solders. In particular, whisker growth out of Sn-plated surfaces has been studied extensively in recent years due to the advent of next-generation, environment-friendly, Pb-free microelectronic packaging. Here, we review this scientifically challenging and technologically important problem, especially in the light of relatively new insights gained in the recent past, intending to provide a quick overview of the important results and stimulating future studies. In particular, we discuss the mechanisms of whisker growth by critically examining the roles of stress and its regeneration, oxide layer, diffusion conduits, and crystal anisotropy in creating conditions conducive for whiskering. We also discuss the recent proposals for effectively mitigating whisker growth in Sn coatings. Finally, an outlook is provided, with details of important unresolved issues related to whisker growth.
机译:晶须是材料的自发丝状生长,是影响包括镀锡和富锡焊料的微电子封装的主要长期可靠性问题。特别是,由于下一代环保无铅微电子封装的出现,近年来对镀锡表面的晶须生长进行了广泛的研究。在这里,我们回顾了这一具有科学挑战性和技术重要性的问题,特别是根据最近获得的相对较新的见解,旨在快速概述重要结果,并激励未来的研究。特别是,我们通过严格检查应力及其再生、氧化层、扩散管道和晶体各向异性在创造有利于晶须生长的条件中的作用,讨论了晶须生长的机制。我们还讨论了最近提出的有效抑制锡涂层中晶须生长的建议。最后,展望了与胡须生长相关的重要未解决问题的细节。

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