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Design strategy and interface chemistry of ageing stable AZO films as high quality transparent conducting oxide

机译:老化稳定Azo薄膜的设计策略与界面化学,如高品质透明导电氧化物

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In this work, an attempt has been made to produce high quality Al-doped ZnO (AZO) transparent conduc-tors by pulsed direct current (DC) magnetron sputtering under varied process conditions, namely sputtering power, sputtering pressure, doping level, and deposition time. The idea is to develop stable AZO films with excellent electro-optical properties, which can replace indium tin oxide (ITO) as transparent conducting oxide. The films are deposited on glass and polyethylene terephthalate (PET) substrates and characterized by X-ray diffraction (XRD), Raman spectroscopy, field emission scanning electron microscopy (FESEM), and energy dispersive X-ray spectroscopy (EDS) for material properties. The electronic and optical properties are investigated using UV-Vis-NIR absorption spectroscopy, photoluminescence spectroscopy, four probe resistivity and Hall measurements, which facilitate the design strategy to achieve promising electro-optical properties. AZO films under optimized process conditions possess sheet resistance below 5 X/sq. and maximum visible light transmittance close to 90%. The lowest value of electrical resistivity is found to be 2.1 x 10(-4) Omega center dot cm. The combination of low electrical resistivity and high optical transparency leading to the figure of merit of the order of 10(-2) Omega(-1) is critically dependent on the process conditions of sputtering as well as doping contents. High free carrier concentration in AZO films leads to the Burstein-Moss shift and this observed blue shift of the absorption spectrum as compared to that of ZnO with native defects depends on the doping contents and the process conditions. This work further explores the role of interface chemistry to achieve high stability of AZO films under ambient oxidizing conditions. The adsorption kinetics of cationic rhodamine 6G and anionic methyl orange at AZO surface with varying adsorption sites and ageing studies on the sheet resistance reveal that the excellent stability of AZO films is delicately linked to the process conditions as well as the content of the dopant material used in the preparation of the AZO sputtering targets. The findings of the study con-firm that the sheet resistances of selective AZO films undergo no change and fixed at 4.5 Omega/sq. even for ageing period of over six months. (c) 2020 Elsevier Inc. All rights reserved.
机译:在这项工作中,尝试在不同的工艺条件下,即溅射功率、溅射压力、掺杂水平和沉积时间下,通过脉冲直流磁控溅射制备高质量的掺铝ZnO(AZO)透明导体。其想法是开发具有优异电光性能的稳定AZO薄膜,以取代氧化铟锡(ITO)作为透明导电氧化物。薄膜沉积在玻璃和聚对苯二甲酸乙二醇酯(PET)衬底上,并通过X射线衍射(XRD)、拉曼光谱、场发射扫描电子显微镜(FESEM)和能量色散X射线光谱(EDS)对材料性能进行表征。利用紫外-可见-近红外吸收光谱、光致发光光谱、四探针电阻率和霍尔测量对其电子和光学性质进行了研究,这有助于设计策略,以实现有希望的电光性质。在优化的工艺条件下,AZO薄膜的薄层电阻低于5 X/sq,最大可见光透过率接近90%。电阻率的最低值为2.1 x 10(-4)Ω中心点厘米。低电阻率和高光学透明度的结合导致了10(-2)Ω(-1)量级的优值,这在很大程度上取决于溅射工艺条件以及掺杂含量。AZO薄膜中的高自由载流子浓度导致了Burstein-Moss位移,与具有本征缺陷的ZnO相比,观察到的吸收光谱蓝移取决于掺杂含量和工艺条件。这项工作进一步探索了界面化学在环境氧化条件下实现AZO薄膜高稳定性的作用。阳离子罗丹明6G和阴离子甲基橙在具有不同吸附位置的AZO表面上的吸附动力学以及对薄片电阻的老化研究表明,AZO薄膜的优异稳定性与制备AZO溅射靶所用的工艺条件以及掺杂材料的含量密切相关。该研究结果证实,选择性AZO薄膜的薄层电阻没有变化,即使在超过六个月的老化期内,也固定在4.5Ω/sq。(c) 2020爱思唯尔公司版权所有。

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