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首页> 外文期刊>Analytical chemistry >CYCLIC VOLTAMMETRIC STUDIES OF CHARGE TRANSFER REACTIONS AT HIGHLY BORON-DOPED POLYCRYSTALLINE DIAMOND THIN-FILM ELECTRODES
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CYCLIC VOLTAMMETRIC STUDIES OF CHARGE TRANSFER REACTIONS AT HIGHLY BORON-DOPED POLYCRYSTALLINE DIAMOND THIN-FILM ELECTRODES

机译:高硼掺杂多晶金刚石薄膜电极上电荷转移反应的循环伏安研究

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摘要

Cyclic voltammetry and ac impedance analysis were used to measure the background current response and capacitance of interfaces formed at as grown (untreated) boron-doped polycrystalline diamond thin-film electrodes in contact with aqueous electrolytes. The diamond films (similar to 1 cm(2), 15 mu m thick; carrier concentration, similar to 10(17) cm(-3)) were grown on conducting Si substrates by plasma-enhanced chemical vapor deposition. Cyclic voltammetry was also used to determine the charge transfer reactions of several redox analytes at as grown and chemically wet etched diamond thin-film electrodes and to study the effect of surface pretreatment, including Fe(CN)6(3-/4-), IrCl62-/3-, Ru(NH3)(6)(3+/2+) dopamine, 4-methylcatechol, MV(2+/+10), and ferrocene. The electrochemical response exhibited by the films is explained using two models: (i) traditional electron transfer at a p-type semiconductor-electrolyte interface and (ii) electron transfer at-a composite electrode composed of nondiamond carbon impurities contained within a diamond matrix such that k(degrees)(nondiamond) k degrees(diamond).
机译:循环伏安法和交流阻抗分析用于测量本底电流响应和在与含水电解质接触的生长(未经处理)的掺硼多晶金刚石薄膜电极上形成的界面的电容。金刚石膜(类似于1 cm(2),厚15微米;载流子浓度,类似于10(17)cm(-3))通过等离子体增强化学气相沉积法在导电的Si衬底上生长。循环伏安法还用于确定几种氧化还原分析物在生长和化学湿法腐蚀的金刚石薄膜电极上的电荷转移反应,并研究表面预处理的效果,包括Fe(CN)6(3- / 4-), IrCl62- / 3-,Ru(NH3)(6)(3 + / 2 +)多巴胺,4-甲基邻苯二酚,MV(2 + / + 10)和二茂铁。膜表现出的电化学响应使用两种模型解释:(i)p型半导体-电解质界面的传统电子转移,以及(ii)金刚石基质中包含的非金刚石碳杂质组成的复合电极的电子转移,例如k(度)(非钻石) k度(钻石)。

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