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Chemical Ionization of TNT and RDX with Trimethylsilyl Cation

机译:三甲基甲硅烷基阳离子对TNT和RDX的化学电离

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Fourier transform ion cyclotron resonance mass spectrometry has been used to examine the reactions of Si(CH3)3+ with nitrobenzene, TNT, and RDX. With nitrobenzene, the only reaction observed is adduct formation which generates the C↓(6)H↓(5)NO↓(2)Si(CH↓(3))↓(3)↑(+) ion.. The bimolecular rate constant for the reaction of Si(CH3)3+ with nitrobenzene is measured to be 1.8 × 10↑(-9) cm↑(3) s↑(-1) molecule↓(-1).. With TNT, fragmentation and adduct formation were observed. The bimolecular rate constant for the reaction of Si(CH↓(3))↓(3)↑(+) with TNT is measured to be 0.85 x 10↑(-9) cm↑(3) s↑(-1) molecule↑(-1) With RDX, the dominant reaction observed is adduct formation, but some fragmentation is seen as a minor reaction pathway. The bimolecular rate constant for the reaction of Si(CH↓(3))↓(3)↑(+) with RDX is estimated to be similar to that observed with TNT (~0.7 × 10↑(-9) cm↑(3) s↑(-1) molecule↑(-1). Collision-induced dissociation experiments performed on both the TNT-Si(CH↓(3))↓(3)↑(+) and the RDX-Si(CH↓(3))↓(3)↑(+) adducts using off-resonance collisional activation show the same fragmentation pattern that is observed during adduct formation. This fragmentation pattern appears to be a "fingerprint" for both adducts. These reactions appear to be driven by the high affinity of Si for oxygen and the attraction of the Si(CH↓(3))↓(3)↑(+) ion to the formal negative charge of oxygen in a nitro group. A reaction coordinate diagram for reactions of RDX with Si(CH↓(3))↓(3)↑(+)is derived (from known thermochemistry and ab initio calculations on the reactive intermediates) and its implications are discussed. Reactions of this type could be useful as a detection scheme for common explosives.
机译:傅里叶变换离子回旋共振质谱已用于检查Si(CH3)3+与硝基苯,TNT和RDX的反应。与硝基苯一起观察到的唯一反应是形成加合物,生成C↓(6)H↓(5)NO↓(2)Si(CH↓(3))↓(3)↑(+)离子。双分子速率Si(CH3)3+与硝基苯反应的常数为1.8×10↑(-9)cm↑(3)s↑(-1)分子↓(-1)。观察到形成。 Si(CH↓(3))↓(3)↑(+)与TNT反应的双分子常数经测量为0.85 x 10↑(-9)cm↑(3)s↑(-1)分子↑(-1)在RDX中,观察到的主要反应是加合物形成,但一些碎片被视为次要反应途径。 Si(CH↓(3))↓(3)↑(+)与RDX反应的双分子速率常数估计与TNT(〜0.7×10↑(-9)cm↑(3) )s↑(-1)分子↑(-1)。对TNT-Si(CH↓(3))↓(3)↑(+)和RDX-Si(CH↓( 3))使用非共振碰撞活化的↓(3)↑(+)加合物显示出与加合物形成过程中相同的裂解模式,该裂解模式似乎是两个加合物的“指纹”,这些反应似乎是被驱动的硅对氧的高亲和力和Si(CH↓(3))↓(3)↑(+)离子对硝基中氧的形式负电荷的吸引作用RDX反应的反应坐标图Si(CH↓(3))↓(3)↑(+)(从已知的热化学和对反应性中间体的从头算计算)的衍生及其含义被讨论。这种类型的反应可作为一种检测方法普通炸药。

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