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Application of disorganized monolayer films on gold electrodes to the prevention of surfactant inhibition of the voltammetric detection of trace metals via anodic stripping of underpotential deposits: Detection of copper

机译:金电极上杂乱无章的单层膜在防止表面活性剂抑制阳极电位不足的阳极溶出痕量金属伏安检测中的应用:铜的检测

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Development of an approach to prevention of electrode surface fouling by surfactants in samples is demonstrated. Spontaneously adsorbed monolayer systems employing short alkyl chains and bulky end groups are used to form porous disorganized monolayers on gold electrodes. Detection of copper by stripping of underpotential deposits formed at electrodes modified with disorganized films of mercaptoethanesulfonate (MES), mercaptopropane-sulfonate, mercaptoacetic acid, and mercaptopropanoic acid was possible, and to a much lesser extent at aminoethanethiol and L-cysteine films. Use of short deposition times in conjunction with linear sweep anodic stripping voltammetry allowed detection of Cu2+ ions down to 1 x 10(-6) M in sulfuric acid solution, using underpotential deposition as the deposition step of the procedure. Calibration graphs were linear in the concentration range (1-80) x 10(-6) M Cu2+ using 15-s deposition at 0.00 V versus AgAgCl. The surfactants Tween 20, Tween 80, and Triton X-100 were found to have no affect on detection of Cu2+ ions in the calibration curve concentration range using MES-modified gold electrodes, whereas at unmodified gold electrodes very severe attenuation of the detection capability was manifested. The average slope for all calibration curves at the MES-modified electrode in the absence and presence of the surfactants at two different concentration levels was 0.0710 +/- 0.0024 muA muM(-1); in contrast, the slope of the calibration line at uncoated gold electrodes in the presence of surfactant was 0.0268 muA muM(-1). These results indicate the excellent ability of a disorganized, porous monolayer for prevention of fouling of the electrode surface by the surfactants. [References: 31]
机译:展示了一种防止样品中表面活性剂污染电极表面的方法的开发。使用短的烷基链和庞大的端基的自发吸附的单层系统被用来在金电极上形成多孔的杂乱的单层。通过剥离在巯基乙磺酸盐(MES),巯基丙烷磺酸盐,巯基乙酸和巯基丙酸的杂乱膜上修饰的电极上形成的欠电位沉积物进行铜的检测是可能的,并且在氨基乙硫醇和L-半胱氨酸膜上程度要小得多。短沉积时间与线性扫描阳极溶出伏安法的结合使用,可检测到硫酸溶液中低至1 x 10(-6)M的Cu2 +离子,并使用低电势沉积作为该过程的沉积步骤。校准曲线在浓度范围(1-80)x 10(-6)M Cu2 +中使用15秒沉积在0.00 V电压下与Ag AgCl呈线性关系。发现表面活性剂吐温20,吐温80和Triton X-100对使用MES修饰的金电极在校准曲线浓度范围内的Cu2 +离子检测没有影响,而在未修饰的金电极上,检测能力的衰减非常严重。表现出来。在不存在和存在两种不同浓度水平的表面活性剂的情况下,MES修饰电极上所有校准曲线的平均斜率为0.0710 +/- 0.0024μAmuM(-1);相反,在存在表面活性剂的情况下,未镀金电极上的校准线的斜率为0.0268μAmuM(-1)。这些结果表明,杂乱的多孔单层防止表面活性剂污染电极表面的优异能力。 [参考:31]

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