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Compact freeform illumination system design for pattern generation with extended light sources

机译:具有延长光源的模式生成紧凑型自动照明系统设计

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摘要

One of the major problems in freeform illumination design in a geometrical optics approximation is picture generation with extended light sources. In contrast to the freeform design with zero-etendue sources, the extension of the light source leads to the typical blurring effect and a contrast reduction of the required irradiance. This effect can be minimized by increasing the distance between the freeform surface and the light source, which according to etendue conservation, results in an impractically large projection optic. To tackle this problem, we propose a design concept consisting of the combination of a pattern-generating double freeform surface for collimated beam shaping, which is calculated for a zero-etendue light source, and an imaging projection system with a telecentric object space. The design concept works independently of the shape of the emission area of the light source and does not require a representation of the extended light source by several individual wave-fronts. By interpreting the pattern blurring effect as a composition of a shift contribution and a distortion contribution, we show that both can be minimized simultaneously by an appropriate placement of the object plane of the imaging optics and by making the distance between both freeform surfaces as small as possible. This allows the calculation of compact, energy-efficient freeform illumination systems for picture generation with real extended light sources. We demonstrate the significant blurring reduction by designing a simple illumination system consisting of a collimation optic, a (zero-etendue) double freeform lens for collimated beam shaping, and a projection lens for the generation of the target distribution "Elaine" with an extended Lambertian emitter of 3 mm x 3 mm extension and +/- 42 deg maximum opening angle. For a working distance to the projection system of 500 mm and a target area of 300 mm x 300 mm, a relative blurring extension of 2% is estimated, compared to 23% for a single freeform projector with the same energy throughput and similar lateral extension. The influence of the double-freeform thickness on the blurring reduction is demonstrated, and a summary of the design procedure for the developed design concept is given. (C) 2019 Optical Society of America
机译:几何光学逼近的自由形式照明设计中的一个主要问题是具有扩展光源的图像生成。与具有零能源的自由形式设计相反,光源的延伸导致典型的模糊效果和所需辐照度的对比度降低。通过增加根据光源之间的距离,这可以最小化这种效果,这根据精度守恒,导致不切实际的投影光学器件。为了解决这个问题,我们提出了一种设计概念,该设计概念由用于准直的光束整形的图案产生双面自由形表面的组合组成,其用于零能量光源,以及具有远心对象空间的成像投影系统。设计概念独立于光源的发光区域的形状,并且不需要几个单独的波端的延伸光源的表示。通过将模式模糊效应解释为换档贡献的组成和失真贡献,我们表明两者都可以通过适当放置成像光学器件的物体平面的适当放置来同时最小化,并且通过使得两个自由形状表面之间的距离可能的。这允许使用真正的延长光源的图像生成计算紧凑,节能的自由形式照明系统。我们通过设计由用于准直光束整形的准直光学,A(零能级)双自由形状透镜组成的简单照明系统来展示显着的模糊减少,以及用于使用扩展兰伯利安的目标分布“Elaine”的投影镜头发射极3 mm x 3 mm延伸,+/- 42°最大打开角度。对于500mm的投影系统的工作距离和300mm×300mm的目标面积,估计2%的相对模糊延伸,而单个自由落体投影仪具有相同的能量吞吐量和类似的横向延伸的相对模糊延伸。 。对双重自由厚度对模糊减少的影响进行了说明,并给出了开发设计概念的设计过程的摘要。 (c)2019年光学学会

著录项

  • 来源
    《Applied optics》 |2019年第10期|共12页
  • 作者单位

    Friedrich Schiller Univ Jena Abbe Ctr Photon Inst Appl Phys D-07743 Jena Germany;

    Friedrich Schiller Univ Jena Abbe Ctr Photon Inst Appl Phys D-07743 Jena Germany;

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  • 正文语种 eng
  • 中图分类 应用;
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