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Sputtered In-x(O,S)(y) Buffer Layers for Cu(In,Ga)Se-2 Thin-Film Solar Cells: Engineering of Band Alignment and Interface Properties

机译:用于Cu(o,s)Se-2薄膜太阳能电池的溅射的in-x(o,s)(y)缓冲层:带对准和界面性能的工程

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摘要

We propose a simple approach to engineering the sputtered In-x(O,S)(y)/Cu(In,Ga)Se-2 heterojunction, in terms of band alignment and interface properties. The band alignment was tailored by tuning the base pressure of the sputtering deposition to incorporate oxygen into deposited In2S3 layers (termed as In-x(O,S)(y)). The interface properties were improved by optimizing the air-annealing temperature on In-x(O,S)(y)/Cu(In,Ga)Se-2 stacked layers. Increasing the base pressure raises the O/(S + 0) ratio contained in deposited In-x(O,S)(y) films and thus widens the band gaps. This could effectively tailor the conduction band offset (Delta E-C) at the In-x(O,S)(y)/ Cu(In,Ga)Se-2 interface from a cliff (-0.25 eV) to a nearly flat band (0.07 eV) alignment. On the other hand, the extra air annealing at 235 degrees C did not significantly change the band alignment but did ameliorate the interface properties by reducing the Cu content at the Cu(In,Ga)Se-2 surface and diminish the interface defect density induced by sputtering damages. The former might enhance the type of inversion and increase the hole barrier at the interface, preventing the detrimental recombination behavior. The latter could effectively strengthen the junction quality. Consequently, our approach substantially enhances the cell efficiency from 2.30% to 11.04%.
机译:我们提出了一种简单的方法,以便在带对准和界面性质方面用溅射的X(O,S)(Y)/ Cu(y)/ Cu(In,Ga)Se-2异质结。通过调节溅射沉积的基础压力来定制带对准,将氧掺入沉积的In2S3层中(称为In-x(O,S)(Y))。通过优化In-X(O,S)/ Cu(In,Ga)Se-2堆叠层的空气退火温度来改善界面性质。增加基础压力提高沉积的X(O,S)(Y)膜中包含的O /(S + 0)比,从而加宽带间隙。从悬崖(-0.25eV)到几乎平坦的带( 0.07eV)对齐。另一方面,在235摄氏度下的额外空气退火并没有显着改变带对准,但通过减少Cu(In,Ga)SE-2表面的Cu含量来改善界面性质,并在诱导的界面缺陷密度降低通过溅射损坏。前者可以增强反转类型并增加界面处的孔屏障,防止有害的重组行为。后者可以有效地增强结质量。因此,我们的方法大大提高了2.30%至11.04%的电池效率。

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