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Effect of Static and Rotating Magnetic Fields on Low-Temperature Fabrication of InGaZnO Thin-Film Transistors

机译:静态磁场对Ingazno薄膜晶体管低温制造的影响

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We suggest thermal treatment with static magnetic fields (SMFs) or rotating magnetic fields (RMFs) as a new technique for the activation of indium-gallium-zinc oxide thin-film transistors (IGZO TFTs). Magnetic interactions between metal atoms in IGZO films and oxygen atoms in air by SMFs or RMFs can be expected to enhance metal oxide (M-O) bonds, even at low temperature (150 degrees C), through attraction of metal and oxygen atoms having their magnetic moments aligned in the same direction. Compared to IGZO TFTs with only thermal treatment at 300 degrees C, IGZO TFTs under an RMF (1150 rpm) at 150 degrees C show superior or comparable characteristics: field-effect mobility of 12.68 cm(2) V-1 s(-1), subthreshold swing of 0.37 V dec(-1), and on/off ratio of 1.86 X 10(8). Although IGZO TFTs under an SMF (0 rpm) can be activated at 150 degrees C, the electrical performance is further improved in IGZO TFTs under an RMF (1150 rpm). These improvements of IGZO TFTs under an RMF (1150 rpm) are induced by increases in the number of M-O bonds due to enhancement of the magnetic interaction per unit time as the rpm value increases. We suggest that this new process of activating IGZO TFTs at low temperature widens the choice of substrates in flexible or transparent devices.
机译:我们建议用静态磁场(SMF)或旋转磁场(RMF)作为激活铟 - 镓 - 氧化锌薄膜晶体管(IGZO TFT)的新技术。通过SMF或RMFS在空气中的IgZO膜和氧原子之间的金属原子之间的磁性相互作用可以通过在低温(150℃)下,通过具有它们的磁性时刻的金属和氧原子来增强金属氧化物(Mo)键在同一方向上对齐。与仅在300摄氏度的热处理的IGZO TFT相比,在150摄氏度下的RMF(1150rpm)下的IgZO TFT显示出优异的或可比特性:场效应迁移率为12.68cm(2)V-1 s(-1) ,划分为0.37 V Dec(-1)的划线摆动,开/关比为1.86 x 10(8)。尽管在150摄氏度下的SMF(0RPM)下的IGZO TFT可以激活,但在RMF(1150rpm)下IGZO TFT中进一步改善了电气性能。由于RPM值增加,由M-O键的数量增加,通过增加M-O键的数量的增加,诱导这些IGZO TFT的改善。我们建议在低温下激活IGZO TFT的新过程扩大了柔性或透明装置中基板的选择。

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