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首页> 外文期刊>ACS applied materials & interfaces >Spatially Selective Enhancement of Photoluminescence in MoS2 by Exciton-Mediated Adsorption and Defect Passivation
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Spatially Selective Enhancement of Photoluminescence in MoS2 by Exciton-Mediated Adsorption and Defect Passivation

机译:激子介导的吸附和缺陷钝化在空间上选择性增强MOS2中的光致发光

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Monolayers of transition-metal dichalcogenides (TMDs) are promising components for flexible optoelectronic devices because of their direct band gap and atomically thin nature. The photoluminescence (PL) from these materials is often strongly suppressed by nonradiative recombination mediated by midgap defect states. Here, we demonstrate up to a 200-fold increase in PL intensity from monolayer MoS2 synthesized by chemical vapor deposition (CVD) by controlled exposure to laser light in the ambient. This spatially resolved passivation treatment is stable in air and vacuum. Regions unexposed to laser light remain dark in fluorescence despite continuous impingement of ambient gas molecules. A wavelength-dependent study confirms that PL brightening is concomitant with exciton generation in the MoS2; laser light below the optical band gap fails to produce any enhancement in the PL. We highlight the photosensitive nature of the process by successfully brightening with a low-power broadband white light source. We decouple changes in absorption from defect passivation by examining the degree of circularly polarized PL. This measurement, which is independent of exciton generation, confirms that laser brightening reduces the rate of nonradiative recombination in the MoS2. A series of gas exposure studies demonstrate a clear correlation between PL brightening and the presence of water. We propose that H2O molecules passivate sulfur vacancies in the CVD-grown MoS2 but require photogenerated excitons to overcome a large adsorption barrier. This work represents an important step in understanding the passivation of CVD-synthesized TMDs and demonstrates the interplay between adsorption and exciton generation.
机译:过渡金属二甲硅藻(TMDS)的单层是具有柔性光电器件的有前途的组件,因为它们的直接带隙和原子上薄的性质。来自这些材料的光致发光(PL)通常受到由中腔缺陷状态介导的非抗体重组的强烈抑制。在这里,我们通过在环境温度下通过控制暴露于通过控制暴露于激光来展示来自由化学气相沉积(CVD)合成的单层MOS2的PL强度增加到200倍。这种空间解决的钝化处理在空气和真空中是稳定的。尽管环境气体分子连续冲击,但未曝光激光的区域在荧光中保持着暗。波长依赖性研究证实,PL亮化伴随着MOS2中的激子产生;光带隙下方的激光不能在PL中产生任何增强。我们通过用低功耗宽带白光源成功亮起来突出该过程的光敏性质。通过检查圆极化PL的程度,我们通过检查缺陷钝化的吸收变化。这种独立于激子生成的测量证实,激光亮化降低了MOS2中的非接收重组速率。一系列气体曝光研究表明了PL亮化与水的存在之间的明显相关性。我们提出了H2O分子在CVD生长MOS2中钝化硫空位,但需要光源激子克服大吸附屏障。这项工作代表了了解CVD合成TMDS的钝化并演示吸附与激子生成之间的相互作用的重要一步。

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