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Control of Circular Photogalvanic Effect of Surface States in the Topological Insulator Bi2Te3 via Spin Injection

机译:通过旋转注射控制拓扑绝缘体Bi2te3中表面状态的圆形光致vanic效应

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摘要

The circular photogalvanic effect (CPGE) provides a method utilizing circularly polarized light to control spin photocurrent and will also lead to novel opto-spintronic devices. The CPGE of three-dimensional topological insulator Bi2Te3 with different substrates and thicknesses has been systematically investigated. It is found that the CPGE current can be dramatically tuned by adopting different substrates. The CPGE current of the Bi2Te3 films on Si substrates are more than two orders larger than that on SrTiO3 substrates when illuminated by 1064 nm light, which can be attributed to the modulation effect due to the spin injection from Si substrate to Bi2Te3 films, larger light absorption coefficient, and stronger inequivalence between the top and bottom surface states for Bi2Te3 films grown on Si substrates. The excitation power dependence of the CPGE current of Bi2Te3 films on Si substrates shows a saturation at high power especially for thicker samples, whereas that on SrTiO3 substrates almost linearly increases with excitation power. Temperature dependence of the CPGE current of Bi2Te3 films on Si substrates first increases and then decreases with decreasing temperature, whereas that on SrTiO3 substrates changes monotonously with temperature. These interesting phenomena of the CPGE current of Bi2Te3 films on Si substrates are related to the spin injection from Si substrates to Bi2Te3 films. Our work not only intrigues new physics but also provides a method to effectively manipulate the helicity-dependent photocurrent via spin injection.
机译:圆形光敏vanic效应(CPGE)提供利用圆偏振光来控制旋转光电流的方法,并且还将导致新型光旋式装置。已经系统地研究了具有不同基板和厚度的三维拓扑绝缘体Bi2Te3的CPGE。发现CPGE电流可以通过采用不同的基板来显着调整。当通过1064nm光照射时,Si基板上的Bi2te3膜的CPGE电流大于SRTIO3基板上的两个订单,这可能归因于从Si衬底到Bi2Te3薄膜的旋转注射引起的调制效果,更大的光在Si衬底上生长的Bi2Te3膜的顶部和底部表面状态的吸收系数和较强的不平等性。 Si基板上Bi2Te3膜的CPGE电流的激励功率依赖性显示出高功率的饱和度,特别是对于较厚的样品,而在SRTIO3基板上几乎线性地随着激励功率而增加。 Bi2Te3膜对Si基板的CPGE电流的温度依赖性首先增加,然后随温度降低而降低,而在SRTIO3衬底上随温度变化。 Si基材上Bi2Te3薄膜的CPGE电流的这些有趣现象与Si基材的旋转注入与Bi2Te3膜有关。我们的工作不仅涉及新物理学,还提供了一种通过旋转注射有效地操纵螺旋依赖性光电流的方法。

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  • 来源
    《ACS applied materials & interfaces》 |2020年第15期|共10页
  • 作者单位

    Fuzhou Univ Inst Micro Nano Devices &

    Solar Cells Sch Phys &

    Informat Engn Fuzhou 350108 Peoples R China;

    Fuzhou Univ Inst Micro Nano Devices &

    Solar Cells Sch Phys &

    Informat Engn Fuzhou 350108 Peoples R China;

    Tsinghua Univ Dept Phys State Key Lab Low Dimens Quantum Phys Beijing 100084 Peoples R China;

    Fuzhou Univ Inst Micro Nano Devices &

    Solar Cells Sch Phys &

    Informat Engn Fuzhou 350108 Peoples R China;

    Inst Semicond Key Lab Semicond Mat Sci Beijing 100083 Peoples R China;

    Inst Semicond Key Lab Semicond Mat Sci Beijing 100083 Peoples R China;

    Inst Semicond Key Lab Semicond Mat Sci Beijing 100083 Peoples R China;

    Univ New South Wales Sch Phys Sydney NSW 2052 Australia;

    Fuzhou Univ Inst Micro Nano Devices &

    Solar Cells Sch Phys &

    Informat Engn Fuzhou 350108 Peoples R China;

    Fuzhou Univ Inst Micro Nano Devices &

    Solar Cells Sch Phys &

    Informat Engn Fuzhou 350108 Peoples R China;

    Tsinghua Univ Dept Phys State Key Lab Low Dimens Quantum Phys Beijing 100084 Peoples R China;

    Tsinghua Univ Dept Phys State Key Lab Low Dimens Quantum Phys Beijing 100084 Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学工业;
  • 关键词

    circular photogalvanic effect; topological insulator; Bi2Te3; substrates; temperature; spin injection;

    机译:圆形光致vanic效果;拓扑绝缘体;Bi2te3;基板;温度;旋转注射;

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