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首页> 外文期刊>ACS nano >High-Frequency Elastic Coupling at the Interface of van der Waals Nanolayers Imaged by Picosecond Ultrasonics
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High-Frequency Elastic Coupling at the Interface of van der Waals Nanolayers Imaged by Picosecond Ultrasonics

机译:通过PICOSECOND Ultrasonics成像的Van der Waals纳米纳米界面处的高频弹性耦合

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Although the topography of van de Waals (vdW) layers and heterostructures can be imaged by scanning probe microscopy, high-frequency interface elastic properties are more difficult to assess. These can influence the stability, reliability, and performance of electronic devices that require uniform layers and interfaces. Here, we use picosecond ultrasonics to image these properties in vdW layers and heterostructures based on well-known exfoliable materials, i.e., InSe, hBN, and graphene. We reveal a strong, uniform elastic coupling between vdW layers over a wide range of frequencies of up to tens of gigahertz (GHz) and in-plane areas of 100 mu m(2). In contrast, the vdW layers can be weakly coupled to their supporting substrate, behaving effectively as free-standing membranes. Our data and analysis demonstrate that picosecond ultrasonics offers opportunities to probe the high-frequency elastic coupling of vdW nanolayers and image both "perfect" and "broken" interfaces between different materials over a wide frequency range, as required for future scientific and technological developments.
机译:虽然可以通过扫描探针显微镜进行van de Wa种(Vdw)层和异质结构的地形,但高频接口弹性性能更难以评估。这些可以影响需要均匀层和界面的电子设备的稳定性,可靠性和性能。在这里,我们使用PicoSecond超声波在VDW层和异质结构中以众所周知的剥离材料,即INSE,HBN和石墨烯来形象这些属性。我们揭示了VDW层之间的强大,均匀的弹性耦合,在多达数十的千兆赫兹(GHz)和100μm(2)的平面内区域的宽范围内。相反,VDW层可以弱耦合到它们的支撑基板,表现为独立膜。我们的数据和分析表明,PICOSecond超声波提供了探讨VDW纳米组和图像的高频弹性耦合和图像在宽频范围内不同材料之间的“完美”和“破碎”界面的机会,如未来的科技发展所需的。

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