机译:将石墨烯皱纹图案雕刻成兼容的基材
CAS J Heyrovsky Inst Phys Chem Vvi Dolejskova 2155-3 Prague 18223 8 Czech Republic;
Fdn Res &
Technol Hellas FORTH ICE HT Inst Chem Engn Sci Stadiou St Patras 26504 Greece;
Fdn Res &
Technol Hellas FORTH ICE HT Inst Chem Engn Sci Stadiou St Patras 26504 Greece;
CAS J Heyrovsky Inst Phys Chem Vvi Dolejskova 2155-3 Prague 18223 8 Czech Republic;
CAS J Heyrovsky Inst Phys Chem Vvi Dolejskova 2155-3 Prague 18223 8 Czech Republic;
CAS J Heyrovsky Inst Phys Chem Vvi Dolejskova 2155-3 Prague 18223 8 Czech Republic;
CAS Inst Phys Vvi Cukrovarnicka 10-112 Prague 16200 6 Czech Republic;
CAS Inst Phys Vvi Cukrovarnicka 10-112 Prague 16200 6 Czech Republic;
Fdn Res &
Technol Hellas FORTH ICE HT Inst Chem Engn Sci Stadiou St Patras 26504 Greece;
CAS J Heyrovsky Inst Phys Chem Vvi Dolejskova 2155-3 Prague 18223 8 Czech Republic;
机译:将石墨烯皱纹图案雕刻成兼容的基材
机译:模量梯度顺应性基底上钽膜的起皱图样
机译:柔顺基材上的液晶聚合物薄膜的光控制图案皱纹
机译:柔顺薄衬底上刚性膜表面皱纹的有限元模拟
机译:弹性薄膜在顺应性基材上起皱。
机译:水使石墨烯皱纹变平:将石墨烯激光冲击包裹在衬底支撑的晶体等离激元纳米颗粒阵列上
机译:水平坦石墨烯皱纹:石墨烯激光冲击包装在基材支撑的晶体等离子体纳米粒子阵列上
机译:应用于图案/柔顺基板上的应变半导体外延的一些新型原位研究