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Two-dimensional MoSe2/graphene heterostructure thin film with wafer-scale continuity via van der Waals epitaxy

机译:二维MOSE2 /石墨烯异质结构薄膜,晶片级连续性通过van der Waals外延

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摘要

Two-dimensional MoSe2/graphene heterostructure in a wafer-scale was realized by a new method involves physical vapor deposition (PVD), in which the MoSe2 film was vertically stacked on graphene by evaporating the MoSe2 compounds using an electron gun evaporator. A preferred lattice orientation with the underlying graphene was identified by transmission electron microscopy, revealing the van der Waals epitaxy (VdWs) of MoSe2. The interface interaction between the graphene substrate and the MoSe2 epilayer was investigated via Raman spectroscopy. The growth technique provides a facile route to create large area VdWs heterostructures, which can be developed for future mass production of nano-devices.
机译:通过一种新方法实现晶片级中的二维MOSE2 /石墨烯异质结构涉及物理气相沉积(PVD),其中通过使用电子枪蒸发器蒸发MOSE2化合物,在石墨烯上垂直堆叠MOSE2膜。 通过透射电子显微镜鉴定与底层石墨烯的优选晶格取向,揭示了MOSE2的范德瓦尔斯外延(VDW)。 通过拉曼光谱研究石墨烯底物和MOSE2癫痫膜之间的界面相互作用。 增长技术提供了一个容易的路线来创建大面积VDWS异质结构,这可以为纳米器件的未来批量生产开发。

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