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Electrodeposition fabrication of Cu@Ni core shell nanowire network for highly stable transparent conductive films

机译:Cu @ Ni核心壳纳米线网络的电沉积制造,用于高稳态透明导电膜

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摘要

Copper nanowire (CuNW) is one of the most promising candidates for next-generation transparent conductive film (TCF). However, practical applications of CuNW are still limited by several drawbacks, including loose wire to wire junctions, poor resistance against oxidation, chemical and thermal damage. To concurrently address these urgent issues, highly conductive and stable TCF is prepared based on Cu@Ni core-shell NW networks by electrodeposition. The coated Ni shell can weld stacked NWs tightly, which decreases the sheet resistance from 513 to 15.8 Ohm/sq (at a transmittance of 88%), as well as improves the mechanical stability (1.03-fold resistance increase after 2000 cyclic bending). The Cu@Ni NW TCF exhibits excellent antioxidation performance after storing in atmospheric environment for 168 h. The passivation Ni shell also improvs the chemical and thermal stability. The Cu@Ni NW network keeps intact after 450 s H2O2 corrosion and heating at 400 degrees C for 30 min. Moreover, a flexible transparent heater was fabricated based on these TCFs, which shows excellent uniform heating performance and high response speed.
机译:铜纳米线(CUNW)是下一代透明导电膜(TCF)最有希望的候选人之一。然而,CUNW的实际应用仍然受到几个缺点的限制,包括线码连接的松动线,抗氧化差,化学和热损坏。要同时解决这些紧急问题,通过电沉积基于Cu @ Ni核心壳NW网络准备高导电和稳定的TCF。涂覆的Ni壳可以紧紧地焊接堆叠的NWS,这将薄层电阻从513降至15.8欧姆/平方(以88%的透射率),并且提高了机械稳定性(2000后循环弯曲后的1.03倍的电阻增加)。在大气环境中储存168小时后,Cu @ Ni Ni TCF在储存后表现出优异的抗氧化性能。钝化Ni壳还可以提高化学和热稳定性。 CU @ Ni NW网络在450秒的H2O2腐蚀后保持完整,并在400℃下加热30分钟。此外,基于这些TCF制造了一种柔性透明加热器,其显示出优异的均匀加热性能和高响应速度。

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