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Change of the properties of nanostructured MoO3 thin films using gamma-ray irradiation

机译:使用γ射线照射改变纳米结构MOO3薄膜的性质

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Thin films of Molybdenum trioxide (MoO3) were deposited on glass substrates by the spray pyrolysis at 500 degrees C and the samples were then exposed to gamma gamma radiation doses by Co-60 radioisotope at different doses (0.1, 10 and 50 kGy). The effects of gamma irradiation on the properties of MoO3 thin films were investigated. The XRD pattern and Raman spectroscopy of as-deposited MoO3 samples show an orthorhombic structure related to alpha-MoO3 with (0k0) preferred orientations. Uv-vis spectra were studied to investigate the transmission measurements of MoO3 films. The optical energy band gap and Urbach energy were found to be gamma-dose dependent. Photoluminescence measurements at room temperature using 300 nm wavelength excitation were investigated. SEM images indicate the formation of alpha-MoO3 nanorods.
机译:通过以500℃的喷雾热解沉积三氧化钼(MOO3)的薄膜,然后通过在不同剂量(0.1,10和50kgy)上通过CO-60放射性同位素暴露于γγ辐射剂量的玻璃底胶片上。 研究了γ辐射对MOO3薄膜性能的影响。 沉积的MOO3样品的XRD图案和拉曼光谱显示与α-MOO3有关的正交结构,具有(0k0)优选取向。 研究了UV-Vis光谱,以研究MOO3薄膜的透射测量。 发现光学能带隙和URBACH能量依赖于γ-剂量。 研究了使用300nm波长激发的室温下的光致发光测量。 SEM图像表示alpha-moo3纳米棒的形成。

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