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Physical vapor deposition technology for coated cutting tools: A review

机译:用于涂层切削工具的物理气相沉积技术:综述

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摘要

Due to various difficult-to-machine materials and increasingly severe machining conditions, more and more attention has been paid to the physical vapor deposition (PVD) technology in recent decades to deposit hard coatings on cutting tools. Combined with the status of industrial application of PVD technology, this paper reviews the main PVD techniques for coated cutting tools from the perspective of the overall PVD coating equipment, including cathodic arc evaporation and magnetron sputtering as well as their hybrid techniques, and the plasma etching which is critical for coating adhesion strength is also involved. With regard to hard coating deposition on cuffing tools, the basic principle, cathode configuration, magnetron and power supply are outlined. Issues related to target ionization ratio, coating deposition rate, coating properties and industrial application of numerous PVD techniques are also highlighted. On plasma etching, inert gas ion etching and metal ions etching are discussed. Finally, this paper summarizes and prospects the PVD technology used for coated cutting tools.
机译:由于各种难以充气的材料和日益严重的加工条件,近几十年来对物理气相沉积(PVD)技术进行了越来越多的关注,以存放在切割工具上的硬涂层。结合PVD技术的工业应用现状,本文综合评论了涂层切削工具的主要PVD技术,包括整体PVD涂层设备的角度,包括阴极电弧蒸发和磁控溅射以及它们的混合技术,以及等离子体蚀刻这对于涂层粘合强度至关重要。关于袖带工具上的硬涂层沉积,概述了基本原理,阴极配置,磁控管和电源。还强调了与靶电离比,涂层沉积速率,涂层性能和众多PVD技术的工业应用相关的问题。在等离子体蚀刻中,讨论了惰性气体离子蚀刻和金属离子蚀刻。最后,本文总结和展望用于涂层切削工具的PVD技术。

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