Optical, electrical and magnetic properties of copper doped electrodeposited MoO3 thin films

摘要

Copper-doped MoO3 thin films were prepared via electrodeposition technique. The techniques adopted for investigating the structural, optical, electrical and magnetic properties of both undoped and copper-doped MoO3 thin films include X-ray diffractometry, UV-visible spectroscopy, four-point probe and vibrating sample magnetometry respectively. Nanocrystalline homogenous grains with polycrystalline orthorhombic (alpha-MoO3) nature were obtained. The optical plots recorded decreased band gap energy from 3.44 eV to 3.27 eV, magnetic studies showed ferromagnetic properties of the doped samples while the electrical study revealed the highest conductivity of 1.5 Omega cm(-1). Doping with Cu has the potentiality of increasing the conductivity of MoO3 thereby enhancing its application in photocells.