...
首页> 外文期刊>CERAMICS INTERNATIONAL >Characteristics of TiAlCN ceramic coatings prepared via pulsed-DC PACVD, part I: Influence of precursors' ratio
【24h】

Characteristics of TiAlCN ceramic coatings prepared via pulsed-DC PACVD, part I: Influence of precursors' ratio

机译:通过脉冲DC PAPVD制备的TiAlcn陶瓷涂层的特性,第一部分:前体比率的影响

获取原文
获取原文并翻译 | 示例
   

获取外文期刊封面封底 >>

       

摘要

In this study, titanium aluminium carbonitride (TiAlCN) ceramic coatings with different precursors' ratio of AlCl3/TiCl4 were deposited on H13 hot work tool steel substrates, using pulsed-DC plasma assisted chemical vapor deposition method. The coatings showed a nanocomposite microstructure consisted of fcc-TiAlN and hcpAlN nanocrystalline grains and an amorphous carbon phase. Increasing the precursors' ratio from 0.5 to 3 led to an increase in Al content from similar to 10 to similar to 42 at.%. Moreover, with increasing the precursors' ratio, the surface roughness of the coating reduced initially from 21.39 to 14.44 nm, due to the creation of more nuclei of A1N and then it rose up to 18.26 nm. Coating with the precursors' ratio of 0.5 presented the highest microhardness of 3840 HV0.01,due to the less amount of chloride impurity and hcp-AlN phase. The precursors' ratio of 0.5 resulted in the highest wear resistance and lowest coefficient of friction of around 0.17.
机译:在本研究中,使用脉冲-DC等离子体辅助化学气相沉积方法,沉积在H13热加工钢基板上具有不同前体的碳氮化铝(TiAlcn)陶瓷涂层。 涂层显示纳米复合材料微观结构由FCC-TiAlN和HcPaln纳米晶粒和无定形碳相组成。 将前体的比例从0.5〜3增加到类似于10〜类似于42.%的含量增加。%。 此外,随着前体的比率增加,由于A1N的更多核的产生,涂层的表面粗糙度最初从21.39%降至14.44nm,然后升高到18.26nm。 由于较少量的氯化物杂质和HCP-ALN相,具有0.5的前体比的涂层为0.5的比例为3840hV0.01。 前体的比例为0.5导致最高耐磨性和最低系数约为0.17。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号