Evaluation of contaminant particle composition by Auger Electron Spectroscopy and identification of surface organic contamination by Time of Flight Secondary Ion mass Spectrometry

摘要

In this paper, we introduce our two measuring instruments for surface analysis, which can evaluate clean environment and surface contamination of silicon wafers. The SMART series based on Auger measurement technique has an ability to analyze composition of fine particles on the test wafer. In this paper, we show typical results of the SMART to detects submicron-size particles and analyze the composition. The TRIFT II based on Time of Flight Secondary Ion Mass Spectrometry can detect both of organic and metal contamination at very low level on the wafer surface. We also show several applications of this instrument.