Nanopatterning of Functional Groups Using Dip-Pen Nanolithography

摘要

Nanopatterning using dip-pen nanolithography (DPN) has been demonstrated with MHA ink on gold substrates in a temperature-controlled and humidity-controlled environment. On the other hand, N-(2-aminoethyl)-3-amino-propyl-trimethoxysilane (AEAPTMS) is used as ink to deposite on the silicon dioxide surface as linker for charged nanoparticles. It is found that the feature size of AEAPTMS can be determined by the environment relative humidity. Patterns down to 60 nm are demonstrated. Also, gold nanoparticles with 15 nm in diameter are selectively deposited on the surfaces of the AEAPTMS DPN patterns.