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首页> 外文期刊>Current applied physics: the official journal of the Korean Physical Society >First-principles study on doping effect of Sn in BiF3 as cathode materials for Li-ion battery
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First-principles study on doping effect of Sn in BiF3 as cathode materials for Li-ion battery

机译:BiF3中作为锂离子电池正极材料的Sn掺杂效应的第一性原理研究

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摘要

First-principles calculations were carried out to investigate the structural relaxation, formation energy, electronic structure and electrochemical properties of Sn-doped BiF3. When Sn was doped into BiF3, two common oxidation states of Sn, +2 and +4, were considered. In addition, some typical neutral and charge defects (Sn-Bi(0), Sn-Bi(1-), Sn-Bi(1+), V-Bi1(2-) V-Bi2(2-) and V-F(0)) were discussed in detail. Calculated formation energies indicate that Sn4+ ion is much easier to dope into BiF3 than Sn2+ ion. When Fermi level lies at the bottom of conduction band, Sn1/2Bi30/32F3 with V-Bi1(2-) (Bi vacancy defect) induced by Sn4+ ion doping has the most stable structure under the rich-F growth condition. Here, Delta mu(Sn), Delta mu(Bi) and Delta mu(F) are -13.18 eV, -9.71 eV and 0, respectively. What's more, the crystal structure, electronic structure and electrochemical properties of Sn1/32Bi30/32F3 with V-Bi1(2-) were further investigated. It is found that the crystal volume of Sn1/32Bi30/32F3 with V-Bi1(2-) is larger than that of pure BiF3 because the length of Bi-F bond around V-Bi1(2-) in the Sn1/32Bi30/32F3 becomes much longer relative to the length of Bi-F bond in the pure BiF3. Besides, the calculated band gap of Sn1/32Bi30/32F3 with V-Bi1(2-) is 2.70 eV, which is smaller than that of pure BiF3. Furthermore, Sn1/32Bi30/32F3 with V-Bi1(2-) has better theoretical voltage and theoretical capacity than pure BiF3. (C) 2015 Elsevier B.V. All rights reserved.
机译:进行了第一性原理计算,以研究掺杂Sn的BiF3的结构弛豫,形成能,电子结构和电化学性能。当将Sn掺杂到BiF3中时,考虑了Sn的两个常见氧化态+2和+4。此外,一些典型的中性和电荷缺陷(Sn-Bi(0),Sn-Bi(1-),Sn-Bi(1 +),V-Bi1(2-)V-Bi2(2-)和VF( 0))进行了详细讨论。计算得出的形成能表明,Sn4 +离子比Sn2 +离子更容易掺入BiF3中。当费米能级位于导带的底部时,由Sn4 +离子掺杂引起的具有V-Bi1(2-)(Bi空位缺陷)的Sn1 / 2Bi30 / 32F3在富F生长条件下具有最稳定的结构。在此,Δmu(Sn),Δmu(Bi)和Δmu(F)分别为-13.18eV,-9.71eV和0。进一步研究了具有V-Bi1(2-)的Sn1 / 32Bi30 / 32F3的晶体结构,电子结构和电化学性能。发现具有V-Bi1(2-)的Sn1 / 32Bi30 / 32F3的晶体体积大于纯BiF3的晶体体积,这是因为Sn1 / 32Bi30 /中V-Bi1(2-)周围的Bi-F键的长度相对于纯BiF3中Bi-F键的长度,32F3变得更长。此外,Sn1 / 32Bi30 / 32F3与V-Bi1(2-)的带隙计算值为2.70 eV,小于纯BiF3的带隙。此外,具有V-Bi1(2-)的Sn1 / 32Bi30 / 32F3具有比纯BiF3更好的理论电压和理论容量。 (C)2015 Elsevier B.V.保留所有权利。

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