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首页> 外文期刊>Current applied physics: the official journal of the Korean Physical Society >Interfacial electronic structure of molybdenum oxide on the fullerene layer, a potential hole-injecting layer in inverted top-emitting organic light-emitting diodes
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Interfacial electronic structure of molybdenum oxide on the fullerene layer, a potential hole-injecting layer in inverted top-emitting organic light-emitting diodes

机译:富勒烯层上的氧化钼的界面电子结构,倒置顶部发光有机发光二极管中的潜在空穴注入层

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摘要

The interfacial electronic structures of molybdenum oxide (MoO_x) deposited on fullerene (C_(60)) which could be used as a hole-injecting layer in inverted top-emitting organic light-emitting diodes (TE-OLEDs) were investigated by photoemission spectroscopy. The hole-injecting barrier height (Φ_B ~h) at each interface investigated by an ultraviolet photoemission spectroscopy was reduced to from 1.4 to 0.1 eV as the thickness of MoO_x (ΘM_(oOx)) was increased from 0.1 to 5.0 nm on C_(60). In these interface system, the sign of vacuum-level shift, highest occupied molecular orbital (HOMO)-level shift, and core-level shifts were all positive indicating that the interface mechanism is attributed to the work-function differences due to a band bending at these interfaces. Moreover, the near-edge X-ray absorption fine structure spectra at carbon K-edge did not show any structural modification as well as any chemical reaction at the MoO_x-on-C_(60) interfaces when Θ_(MoOx) was changed on C_(60). From these results, the inverted TE-OLED with C _(60) (5.0 nm)/MoO_x (5.0 nm) showed the power efficiency of 1.7 lm/W at a luminance of about 1000 cd/m~2 and the maximum luminance of about 76.000 cd/m~2 at the bias voltage of 11.0 V. It exhibited the highest performance among the inverted TE-OLEDs fabricated as a function of MoO_x thickness from 0 to 5.0 nm.
机译:通过光发射光谱研究了沉积在富勒烯(C_(60))上的氧化钼(MoO_x)的界面电子结构,该结构可用作反向顶发射有机发光二极管(TE-OLED)的空穴注入层。在C_(60)上,随着MoO_x(ΘM_(oOx))的厚度从0.1 nm增加到5.0 nm,通过紫外光发射光谱法研究的每个界面处的空穴注入势垒高度(Φ_B〜h)从1.4降低到0.1 eV。 )。在这些界面系统中,真空能级移位,最高占据分子轨道(HOMO)能级移位和核心能级移位的迹象均为正,表明界面机制归因于能带弯曲引起的功函数差异在这些界面上。此外,当C_上的Θ_(MoOx)改变时,碳K边缘的近边缘X射线吸收精细结构光谱未显示任何结构修饰以及MoO_x-on-C_(60)界面上的任何化学反应。 (60)。根据这些结果,在C _(60)(5.0 nm)/ MoO_x(5.0 nm)的条件下,倒置TE-OLED在约1000 cd / m〜2的亮度和最大亮度下显示1.7 lm / W的功率效率。在11.0 V的偏压下约为76.000 cd / m〜2。根据MoO_x厚度从0到5.0 nm的变化,它在倒置的TE-OLED中表现出最高的性能。

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