The Depth-profiling Analysis of Thin Plasmapolymerized Organic Films on the Conductive Substrates by Auger Electron Spectroscopy

摘要

The quantitative and qualitative layer-by-layeranalysis were carried out for the samples of thinplasmapolymerized films which had thickness 1200×0.1μm.These films have been produced by means of deposition on metalsubstrates the plasma activating products of thermodestruction ofsolid polypropylene. Later film surface was sputtered by the beamof Ar ions with the energy up to 1keV. The C KLL line shape wasclosed to the standart one for the amorphous carbon and showedno changed during the film sputtering. Experimental sputteringrate for plasma polymerized fiem was in a good. agrement withone was calculated. taking the sputterig ficoefficient for theamorphous carbon. From these results, we proposed the solidstructural model of plasmapolymerized film. Within the limits ofour model. the disposition of carbon atoms inside the film wassimular to one in the amorphous phase. The mean quantity ofexperimental depth resolution has been found 262×0.1μm,calculated one-268×0.1μm. We observed the ordering of thefilm structure with the characteristic size about 15×0.1μm in thedirection normal to the substrate surface. A simple method forestimating of the plasmapolymerized films thickness above 300×0.1μm was suggested.