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Efficient Charge Injection in p-Type Polymer Field-Effect Transistors with Low-Cost Molybdenum Electrodes through V2O5 Interlayer

机译:通过V2O5中间层在具有低成本钼电极的p型聚合物场效应晶体管中进行高效电荷注入

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摘要

Here we report high-performance polymer OFETs with a low-cost Mo source/drain electrode by efficient charge injection through the formation of a thermally deposited V2O5 thin film interlayer. A thermally deposited V2O5 interlayer is formed between a regioregular poly(3-hexylthiophene) (rr-P3HT) or a p-type polymer semiconductor containing dodecyl-substituted thieny-lenevinylene (TV) and dodecylthiophene (PC12TV12T) and the Mo source/drain electrode. The P3HT or PC12TV12T OFETs with the bare Mo electrode exhibited lower charge carrier mobility than those with Au owing to a large barrier height for hole injection (0.5-1.0 eV). By forming the V2O5 layer, the P3HT or PC12TV12T OFETs with V2O5 on the Mo electrode exhibited charge carrier mobility comparable to that of a pristine Au electrode. Best P3HT or PC12TV12T OFETs with S run thick V2O5 on Mo electrode show the charge carrier mobility of 0.12 and 0.38 cm~2/(V s), respectively. Ultraviolet photoelectron spectroscopy results exhibited the work-function of the Mo electrode progressively changed from 4.3 to 4.9 eV with an increase in V2O5 thickness from 0 to 5 nm, respectively. Interestingly, the V2O5-deposited Mo exhibits comparable R_c to Au, which mainly results from the decreased barrier height for hole carrier injection from the low-cost metal electrode to the frontier molecular orbital of the p-type polymer semiconductor after the incorporation of the transition metal oxide hole injection layer, such as V2O5. This enables the development of large-area, low-cost electronics with the Mo electrodes and V2O5 interlayer.
机译:在这里,我们通过形成热沉积的V2O5薄膜中间层,通过有效的电荷注入,报告了具有低成本Mo源/漏电极的高性能聚合物OFET。在区域规则的聚(3-己基噻吩)(rr-P3HT)或包含十二烷基取代的噻吩-亚乙烯基(TV)和十二烷基噻吩(PC12TV12T)的p型聚合物半导体与Mo源/漏电极之间形成热沉积的V2O5中间层。带有裸钼电极的P3HT或PC12TV12T OFET由于具有高的空穴注入势垒高度(0.5-1.0 eV),因此具有比带有Au的更低的载流子迁移率。通过形成V2O5层,在Mo电极上带有V2O5的P3HT或PC12TV12T OFET表现出的电荷载流子迁移率可与原始Au电极相比。最好的P3HT或PC12TV12T OFET在Mo电极上具有S厚的V2O5,其载流子迁移率分别为0.12和0.38 cm〜2 /(V s)。紫外光电子能谱结果表明,随着V2O5厚度从0到5 nm的增加,Mo电极的功函数逐渐从4.3变为4.9 eV。有趣的是,沉积有V2O5的Mo的R_c与Au相当,这主要是由于在引入过渡元素后,空穴载体从低成本金属电极注入p型聚合物半导体的前沿分子轨道的势垒高度减小而导致的金属氧化物空穴注入层,例如V2O5。这使得能够开发具有Mo电极和V2O5夹层的大面积,低成本电子设备。

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