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Affinity of the Interface between Hydroxyapatite (0001) and Titanium (0001) Surfaces: A First-Principles Investigation

机译:羟基磷灰石(0001)和钛(0001)表面之间的界面亲和力:第一性原理研究

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A basic understanding of the affinity between the hydroxyapatite (HA) and alpha-Ti surfaces is obtained through electronic structure calculations by first-principles method. The surface energies of HA(0001), HA (01 (1) over bar0), HA (10 (1) over bar1), and Ti(0001) surfaces have been calculated. The HA(0001) presents the most thermodynamically stable of HA. The HA/Ti interfaces were constructed by two kinds of interface models, the single interface (denoted as SI) and the double-interface (denoted as DI). Two methods, the full relaxation and the UBER, were applied to determine the interfacial separation and the atomic arrangement in the interfacial zone. The works of adhesion of interfaces with various stoichiometric HA surfaces were evaluated. For the HA(0001)/Ti(0001) interfaces, the work of adhesion is strongly dependent on the chemical environment of the HA surface. The values are -2.33, -1.52, and -0.80 J/m2 for the none-, single-, and double-Ca terminated HA/Ti interfaces, respectively. The influence of atomic relaxation on the work of adhesion and interface separation is discussed. Full relaxation results include -1.99 J/m2 work of adhesion and 0.220 nm separation between HA and Ti for the DI of 1-Ca-HA/Ti interface, while they are -1.14 J/m(2) and 0.235 nm by partial relaxation. Analysis of electronic structure reveals that charge transfer between HA and Ti slabs occurs during the formation of the HA/Ti interface. The transfer generates the Ti-O or Ti-Ca bonds across the interface and drives the HA/Ti interface system to metallic characteristic. The energetically favorable interfaces are formed when the outmost layer of HA comprises more O atoms at the interface.
机译:通过第一原理方法通过电子结构计算获得了对羟基磷灰石(HA)和α-Ti表面之间亲和力的基本了解。计算出HA(0001),HA(bar0上方为01(1),bar(bar1上方为10(1))和Ti(0001)表面的表面能。 HA(0001)呈现HA的最热力学稳定性。 HA / Ti接口由两种接口模型构建,即单接口(表示为SI)和双接口(表示DI)。采用两种方法,即完全弛豫和UBER来确定界面分离和界面区域中的原子排列。评估了界面与各种化学计量HA表面的粘附力。对于HA(0001)/ Ti(0001)界面,粘合作用很大程度上取决于HA表面的化学环境。对于非Ca,单Ca和双Ca端接的HA / Ti接口,值分别为-2.33,-1.52和-0.80 J / m2。讨论了原子弛豫对粘附和界面分离功的影响。完全弛豫的结果包括-1.99 J / m2的粘附功和1-Ca-HA / Ti界面的DI的HA和Ti之间的0.220 nm分离,而通过部分弛豫分别为-1.14 J / m(2)和0.235 nm 。电子结构分析表明,HA和Ti板之间的电荷转移发生在HA / Ti界面形成期间。转移在整个界面上生成Ti-O或Ti-Ca键,并驱动HA / Ti界面系统达到金属特性。当HA的最外层在界面处包含更多的O原子时,形成能量上有利的界面。

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