Photopatterning of Indomethacin Thin Films: a Solvent-Free Vapor-Deposited Photoresist

摘要

We report indomethacin as a photoresist that can be dry-deposited (as well as spin-coated), and developed in weak aqueous base. This is the first reported patterning of indomethacin as a resist material. Nanometer-scale patterns were achieved through DUV photolithography and the underlying patterning mechanism was investigated.