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Inductively coupled plasma atomic emission determination of impurities in high-purity niobium and tantalum oxides after separation of the matrix on a Polyorgs VII sorbent

机译:在Polyorgs VII吸附剂中分离矩阵分离后高纯度铌和钽氧化物中杂质的电感耦合等离子体原子排放测定

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摘要

Two methods were suggested for determining impurities in niobium and tantalum matrices: determination by inductively coupled plasma atomic emission spectrometry (ICP-AES) without preconcentration and determination alter sorption separation of the matrix. Spectral interferences in the ICP-AES determination of impurities m the above matrices were examined. Interelement correction factors were calculated, and sorption behavior of niobium, tantalum, and some other elements on a Polyorgs VII sorbent was studied. From this study, conditions for sorption separation of the matrices were chosen. In addition, procedures for the ICP-AES determination of impurities in high-purity niobium and tantalum oxides were developed (the determination limits are n X 10-0.n #mu#g/g).
机译:提出了两种方法,用于确定铌和钽基质中的杂质:通过电感耦合等离子体原子发射光谱法测定而没有前浓缩的预浓缩和测定的基质的吸附分离。 ICP-AES中的光谱干扰在杂质测定杂质中,研究了上述基质。 研究了间隙校正因子,研究了铌,钽和一些其他元素的吸附行为,研究了Polyorgs VII吸附剂。 从该研究开始,选择基质的吸附分离条件。 此外,开发了ICP-AES测定高纯度铌和氧化钽中杂质的程序(测定限制是N×10-0.n#mu#g / g)。

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