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A piezoelectric deformable X-ray mirror for phase compensation based on global optimization

机译:基于全局优化的相位补偿压电可变形X射线镜

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As a strong tool for the study of nanoscience, the synchrotron hard X-ray nanoprobe technique enables researchers to investigate complex samples with many advantages, such as insitu setup, high sensitivity and the integration of various experimental methods. In recent years, an important goal has been to push the focusing spot size to the diffraction limit of approximate to 10nm. The multilayer-based Kirkpatrick-Baez (KB) mirror system is one of the most important methods used to achieve this goal. This method was chosen by the nanoprobe beamline of the Phase-II project at the Shanghai Synchrotron Radiation Facility. To overcome the limitations of current polishing technologies, the use of an additional phase compensator was necessary to decrease the wavefront distortions. In this experiment, a prototype phase compensator has been created to show how to obtain precise wavefront compensation. With the use of finite-element analysis and Fizeau interferometer measurements, some important factors such as the piezoresponse, different actuator distributions, stability and hysteresis were investigated. A global optimization method based on the measured piezoresponse has also been developed. This method overcame the limitations of the previous local algorithm related to the adjustment of every single actuator for compact piezoelectric layouts. The mirror figure can approach a target figure after several iterations. The figure difference can be reduced to several nanometres, which is far better than the mirror figure errors. The prototype was also used to successfully compensate for the real wavefront errors from upstream and for its own figure errors, measured using the speckle scanning technique. The residual figure error was reduced to a root-mean-square value of 0.7nm.
机译:作为研究纳米科学研究的强大工具,Synchrotron硬X射线NanoProbe技术使研究人员能够研究具有许多优点的复杂样本,例如Insitu设置,高灵敏度和各种实验方法的集成。近年来,一项重要的目标是将聚焦光斑尺寸推向差异约为10nm的衍射极限。基于多层的KirkPatrick-Baez(KB)镜像系统是用于实现这一目标的最重要方法之一。该方法是由上海同步辐射设施的II期项目的Nanoprobe BeamLine选择的。为了克服当前抛光技术的局限性,需要使用额外的相位补偿器来降低波前扭曲。在该实验中,已经创建了一种原型相位补偿器以显示如何获得精确的波前补偿。通过使用有限元分析和FIZEAU干涉仪测量,研究了压电响应,不同的致动器分布,稳定性和滞后等一些重要因素。还开发了一种基于测量压电响应的全局优化方法。该方法克服了与紧凑型压电布局的每个单个致动器的调整相关的先前本地算法的局限。镜像图可以在几次迭代后接近目标图形。图形差异可以减少到几纳米,远远超过镜像误差。原型也用于成功地使用散斑扫描技术来测量上游的真实波前误差和自身的数字错误。将残余图形误差降低到根均方值为0.7nm。

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