Precision Control for Beam Irradiation Dose by Developing a Real-time Dose Monitoring System

摘要

We have developed a real-time dose monitoring system for a low-energy ion-beam facility. Before we developed the monitoring system, the system had given a substantial error of ±23% when we irradiated an ion beam with a dose as much as 3.0 × 1016 cm?2 on the Si substrate. Moreover, a low irradiation dose as small as 1013 cm?2 was scarcely able to be controlled because of a too short irradiation time of several seconds, producing a greater dose error. To develop a real-time dose monitoring system, in this work, we employed a current integrator in conjunction with a beam stopper, by which a dose of 3.0 ×1016 cm?2 can be exactly irradiated on the sample with less than ±6% error, which was ensured by the measurements of Rutherford backscattering spectroscopy.