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Charge compensation and electrical characteristics of Ta2O5-doped SnO2-CoO ceramics

机译:Ta2O5掺杂SnO2-CoO陶瓷的电荷补偿和电气特性

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摘要

We investigated the effect of pentavalent donor dopant Ta2O5 on microstructure development, electric and dielectric characteristics of SnO2-CoO based ceramics. Already low additions of Ta2O5 (0.05 mol%) effectively reduce the porosity, improve densification and dielectric permittivity and trigger a 3-fold increase in SnO2 growth rate. Rietveld analysis shows that the amount of Co2SnO4 spinet phase drops with the addition of Ta2O5 due to incorporation of Co2+ and Ta5+ into SnO2 structure. With higher additions, however, Ta2O5 segregates to the grain boundaries and hinders SnO2 grain growth, which in turn improves electrical properties. TEM/EDS analysis shows that above 0.5 mol% of Ta(2)O(5 )the Co:Ta ratio in SnO2 grains is constant 1:2, which means that a twice lower amount of Ta5+ is incorporated in the SnO2 structure compared to the Ta2O5-doped SnO2-CoO system. Accordingly, the following charge compensation mechanism is proposed: 3 Sn(IV)(Sn)(center dot)((IV)) reversible arrow Co(II)(sn)('')( (IV)) + 2 Ta(V)(sn)(center dot)((IV)).
机译:我们研究了Pentavalent供体掺杂剂Ta2O5对SnO2-Coo基陶瓷的微观结构开发,电和介电特性的影响。已经低添加了Ta2O5(0.05mol%)有效地降低了孔隙率,提高了致密化和介电介电常数,并引发了SnO2生长速率的3倍。 RIETVELD分析表明,由于将CO 2 +和TA5 +掺入SNO2结构,CO2SNO4尖瓣相的量随着TA2O5的添加而增加。然而,具有更高的添加,Ta2O5对晶界和阻碍SnO2晶粒生长,这反过来改善了电性能。 TEM / EDS分析表明,在SNO2晶粒中的CO:Ta比为0.5mol%的Ta(2)O(5)是恒定的1:2,这意味着与Ta2O5掺杂的SnO2-CoO系统。因此,提出了以下电荷补偿机制:3SN(IV)(Sn)(中心点)((IV))可逆箭头CO(II)(SN)('')((IV))+ 2 TA(v )(sn)(中心点)((iv))。

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