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Electrical properties of Ta2O5-doped TiO2 varistor ceramics sintered at low-temperature

机译:低温烧结掺Ta2O5的TiO2压敏陶瓷的电学性能

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TiO2-based varistor ceramics doped with 0.25-1.00 mol% Ta2O5 were prepared by the conventional solid state reaction technique at 1300 degrees C and the effects of Ta2O5 substitution on their electrical properties have been studied. The results showed that the Ta2O5 dopant played an important role in the formation of the grain boundary barriers. Good electrical properties with E-1 (mA)=14.9 V/mm, alpha=4.48, epsilon(r)=9.68 x 10(4), tan delta=0.36 were obtained for 0.50 mol% Ta2O5 addition. These results indicate the 99.5 mol% TiO2+0.50 mol% Ta2O5+2 wt% (0.723 mol% Bi2O3+1 mol% B2O3) composition might be a suitable candidate for capacitor varistor functional device. (C) 2015 Published by Elsevier Ltd and Techna Group S.r.l.
机译:采用传统的固态反应技术,在1300℃下制备了掺有0.25-1.00 mol%Ta2O5的TiO2基压敏陶瓷,并研究了Ta2O5取代对其电学性能的影响。结果表明,Ta2O5掺杂在晶界势垒的形成中起着重要作用。当添加0.50mol%的Ta 2 O 5时,获得了良好的电性能,E-1(mA)= 14.9V / mm,α= 4.48,ε(r)= 9.68×10(4),tanδ= 0.36。这些结果表明,99.5 mol%TiO2 + 0.50 mol%Ta2O5 + 2 wt%(0.723 mol%Bi2O3 + 1 mol%B2O3)组成可能是电容器压敏电阻功能器件的合适候选者。 (C)2015由Elsevier Ltd和Techna Group S.r.l.

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