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首页> 外文期刊>Journal of the Chinese Institute of Engineers >Influences of argon plasma cleaning on the die-shear force of chip and copper/polyimide flexible substrate assembly using a non-conductive film
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Influences of argon plasma cleaning on the die-shear force of chip and copper/polyimide flexible substrate assembly using a non-conductive film

机译:氩等离子体清洁对芯片和铜/聚酰亚胺柔性基板组件模剪力的影响使用非导电膜

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摘要

A non-conductive film (NCF) and a thermal compression process were combined to assemble a chip onto a flexible substrate. To achieve direct bonding and to enhance the adhesion of a chip on the flexible substrate with NCF, argon plasma was used to clean copper electrodes over a flexible substrate. For flexible substrates which received argon plasma cleaning, low contact angles were obtained, and gold bumps directly contacted copper electrodes to form active input/output (I/O) paths, indicating the contaminants on the flexible substrate were removed and a clean bonding surface could be achieved. Neither delamination nor porosity was observed at the bonding interface between the NCF and copper electrodes. A sound bonding interface with satisfactory die-shear force was achieved. The argon plasma cleaning led to a significant improvement of the die-shear force of a chip bonded onto the flexible substrate using NCF.
机译:将非导电膜(NCF)和热压缩过程组合以将芯片组装在柔性基板上。 为了实现直接键合并增强芯片在柔性基板上用NCF的粘附性,使用氩气等离子体在柔性基板上清洁铜电极。 对于接收氩等离子体清洁的柔性基板,获得低接触角,并且直接接触铜电极的金凸块以形成有源输入/输出(I / O)路径,表示柔性基板上的污染物被移除,并且可以进行清洁的粘接表面 取得成就。 在NCF和铜电极之间的键合界面中没有观察到分层或孔隙率。 实现了具有令人满意的模剪力的稳定界面。 氩等离子体清洁导致使用NCF粘合到柔性基板上的芯片的模剪力的显着改善。

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