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首页> 外文期刊>Journal of prosthetics and orthotics: JPO >Parameter extraction technique of millimeter wave small-signal equivalent circuit model of 45 nm MOSFET
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Parameter extraction technique of millimeter wave small-signal equivalent circuit model of 45 nm MOSFET

机译:45 nm MOSFET毫米波小信号等效电路模型参数提取技术

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摘要

?2019, Editorial Office of High Power Laser and Particle Beams. All right reserved. ?2019, Editorial Office of High Power Laser and Particle Beams. All right reserved. With the development of channel down-scaling of low-voltage low-power CMOS technology, the optimal operation points are shown to shift from the strong inversion toward lower moderated inversion and weak inversion regimes. High-frequency equivalent circuit modeling is a prerequisite for finding the physical mechanism of MOSFET device, and is essential for the HF integrated circuits. Based on the physical structure of 45 nm MOSFET device and its Y parameters analysis, a quasi-static approximate RF equivalent circuit model and its high-precision simplified parameter extraction algorithm is proposed by taking into account the intrinsic physical characteristics of the device, the electromagnetic characteristics of the pin and the parasitic characteristics of the test pad and test interconnects, which are used to describe the bias dependence from the strong inversion and weak inversion regimes. Therefore, the device characterizations offer excellent accuracy, continuity and smoothness under different bias condition, and can be easily implanted into commercial EDA tools. Direct extraction method is performed by S-parameter analysis including the intrinsic and the extrinsic components and the substrate-related effect. Finally, the practicability and the accuracy of the proposed model and its parameters extract algorithm are verified by the consistency comparison of the simulated results by using ADS2013 tool and the measured S parameters. The experimental results show the bias dependence of 45nm MOSFET. With the development of channel down-scaling of low-voltage low-power CMOS technology, the optimal operation points are shown to shift from the strong inversion toward lower moderated inversion and weak inversion regimes. High-frequency equivalent circuit modeling is a prerequisite for finding the physical mechanism of MOSFET device, and is essential for the HF integrated circuits. Based on the physical structure of 45 nm MOSFET device and its Y parameters analysis, a quasi-static approximate RF equivalent circuit model and its high-precision simplified parameter extraction algorithm is proposed by taking into account the intrinsic physical characteristics of the device, the electromagnetic characteristics of the pin and the parasitic characteristics of the test pad and test interconnects, which are used to describe the bias dependence from the strong inversion and weak inversion regimes. Therefore, the device characterizations offer excellent accuracy, continuity and smoothness under different bias condition, and can be easily implanted into commercial EDA tools. Direct extraction method is performed by S-parameter analysis including the intrinsic and the extrinsic components and the substrate-related effect. Finally, the practicability and the accuracy of the proposed model and its parameters extract algorithm are verified by the consistency comparison of the simulated results by using ADS2013 tool and the measured S parameters. The experimental results show the bias dependence of 45nm MOSFET.
机译:?2019年,高功率激光器和粒子梁编辑办公室。保留所有权利。 ?2019年,高功率激光器和粒子梁编辑办公室。保留所有权利。随着低压低功耗CMOS技术的信道下缩放的开发,最佳操作点被示出从强逆转朝向更低的逆势反转和弱反转制度转移。高频等效电路建模是找到MOSFET器件的物理机制的先决条件,对于HF集成电路至关重要。基于45nm MOSFET器件的物理结构及其Y参数分析,提出了一种准静态近似RF等效电路模型及其高精度简化参数提取算法,考虑了装置的固有物理特性,电磁销的特性和测试垫的寄生特性和测试互连,用于描述来自强反转和弱反转制度的偏置依赖性。因此,设备特征在不同的偏置条件下提供出色的准确性,连续性和平滑度,并且可以轻松植入商业EDA工具。通过S参数分析进行直接提取方法,包括内在和外在部件和基材相关的效果。最后,通过使用ADS2013工具和测量的S参数,通过模拟结果的一致性比较来验证所提出的模型及其参数提取算法的实用性和准确性。实验结果显示了45nm MOSFET的偏置依赖性。随着低压低功耗CMOS技术的信道下缩放的开发,最佳操作点被示出从强逆转朝向更低的逆势反转和弱反转制度转移。高频等效电路建模是找到MOSFET器件的物理机制的先决条件,对于HF集成电路至关重要。基于45nm MOSFET器件的物理结构及其Y参数分析,提出了一种准静态近似RF等效电路模型及其高精度简化参数提取算法,考虑了装置的固有物理特性,电磁销的特性和测试垫的寄生特性和测试互连,用于描述来自强反转和弱反转制度的偏置依赖性。因此,设备特征在不同的偏置条件下提供出色的准确性,连续性和平滑度,并且可以轻松植入商业EDA工具。通过S参数分析进行直接提取方法,包括内在和外在部件和基材相关的效果。最后,通过使用ADS2013工具和测量的S参数,通过模拟结果的一致性比较来验证所提出的模型及其参数提取算法的实用性和准确性。实验结果显示了45nm MOSFET的偏置依赖性。

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