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首页> 外文期刊>Journal of optoelectronics and advanced materials >Technische Universitat Chemnitz, Institut fur Physik, D-09107 Chemnitz, Germany
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Technische Universitat Chemnitz, Institut fur Physik, D-09107 Chemnitz, Germany

机译:德国D-09107 Chemnitz,Chemnitz技术大学

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A number of oaxis oriented MgB2 thin films were grown in-situ by pulsed laser deposition (PLD) on AI2O3-R cut, and the pinning properties were investigated using transport, DC magnetisation and magneto-optical imaging (MOI) techniques. It was found that at temperatures below 10K and large applied DC magnetic fields, the irreversibility line of/"-situ MgB2 thin films is higher that a bulk material. The critical current density Jc of in-situ thin films is less dependent on the applied magnetic field B than the current density Jc of an ex-situ MgB2 film or bulk. The penetration of magnetic field inside the film is uniform, and it follows the theoretical prediction for a homogenous thin film.
机译:通过脉冲激光沉积(PLD)在AI2O3-R切割的脉冲激光沉积(PLD)地原位生长了许多Oaxis定向的MGB2薄膜,并且使用传输,直流磁化和磁光成像(MOI)技术来研究钉扎性。 发现,在低于10k和大的施加直流磁场的温度下,/“原位MgB2薄膜的不可逆线较高,散装材料较高。原位薄膜的临界电流密度Jc较少依赖于所施加的薄膜 磁场B比前原位MGB2薄膜或散装的电流密度JC。膜内磁场的渗透是均匀的,并且遵循均匀薄膜的理论预测。

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