Anisotropic etching in (311) Si to fabricate sharp resorbable polymer microneedles carrying neural electrode arrays

摘要

Polymer microneedles that get resorbed after insertion in the body have several interesting applications, for example in the insertion of ultra-flexible electrode arrays in neural tissue. In this work, we explore the use of molds created by etching in (3 1 1) silicon as a basis for the fabrication of such microneedles. Such molds can be etched anisotropically to much sharper angles compared to standard (1 0 0) silicon. It is demonstrated that sharp poly lactic-co-glycolic acid (PLGA) microneedles can be fabricated using the molds. It is also shown that by simple thermal bonding the fabricated PLGA microneedles can be combined with a ultra-flexible polyimide-based thin-film electrode array.