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首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >2H - 1T phase transformation in Janus monolayer MoSSe and MoSTe: an efficient hole injection contact for 2H-MoS2
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2H - 1T phase transformation in Janus monolayer MoSSe and MoSTe: an efficient hole injection contact for 2H-MoS2

机译:2h - & Janus Monolayer Mosse的1T相换和大部分:2H-MOS2的有效空穴注入接触

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摘要

Two-dimensional (2D) transition metal dichalcogenides (TMDs) have attracted much scientific attention for applications in nanoelectronic and optoelectronic devices. The physical and chemical properties of 2D TMDs depend on their phase structures. In this study, electron doping-induced 2H 1T structural transformation of MoS2, Janus MoSSe and MoSTe monolayers was studied by using density functional theory. Phonon dispersion calculation showed that both 2H- and 1T-MoSX (X-S, Se and Te) monolayers were dynamically stable. Janus monolayer 2H-MoSX exhibited band gap of 1.0-1.68 eV, whereas Janus monolayer 1T-MoSX was found to be a semiconductor with narrow band gap of 0.13-0.26 eV. The critical values of electron concentration to trigger 2H 1T structural phase transformation decreased as X atom changed from S to Te in MoSX (X-S, Se and Te) monolayer. The in-plane stiffness decreased with increasing electron concentration for 2H-phase, whereas that of the 1T-phase changed slightly with electron concentration; thus, electron doping destabilized the crystal structure of 2H-phase. The 1T-phase could provide an efficient hole injection contact to 2H-MoS2 for use in nano-electronic devices.
机译:二维(2D)过渡金属二甲基甲基(TMDS)吸引了纳米电子和光电器件中的应用的众多科学关注。 2D TMD的物理和化学性质取决于它们的相位结构。在该研究中,通过使用密度函数理论研究了MOS2,Janus Mosse和大部分单层的电子掺杂诱导的MOS2的2H 1T结构变换。声子分散计算显示2H-和1T-MOSX(X-S,SE和TE)单层动态稳定。 Janus Monolayer 2H-MOSX表现出1.0-1.68 eV的带隙,而Janus Monolayer 1T-MOSX被发现是一个狭窄的带隙的半导体,为0.13-0.26eV。作为触发2H 1T结构相变的电子浓度的临界值随着X原子从S到TE在MOSX(X-S,SE和TE)单层中而变化。平面内刚度随着2H相的增加而降低,而1T相的电气浓度的变化略微变化;因此,电子掺杂使2H相的晶体结构不稳定。 1T相可以为2H-MOS2提供有效的空穴注入接触,以用于纳米电子器件。

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