首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >Interfacial electronic states and self-formed p-n junctions in hydrogenated MoS2/SiC heterostructure
【24h】

Interfacial electronic states and self-formed p-n junctions in hydrogenated MoS2/SiC heterostructure

机译:互补MOS2 / SiC异质结构中的界面电子状态和自成的P-N结

获取原文
获取原文并翻译 | 示例
       

摘要

It is difficult to generate p-n junctions in atomically thin transition metal dichalcogenides (TMDs) because of the great challenge of selective doping. First-principles calculations demonstrate that the electronic states in monolayer MoS2 could be substantially tuned through contact with hydrogenated SiC sheets, as a result of interface-induced electronic doping. Specifically, monolayer MoS2 exhibits metallic characteristics when put in contact with the Si termination of SiC-H (MoS2/SiC-H), but exhibits ambipolar type polarization when in contact with the C termination of CSi-H (MoS2/CSi-H). Furthermore, monolayer MoS2 can be switched from p-type on H-Si terminations (MoS2/H-SiC and MoS2/H-SiC-H) to n-type on H-C terminations (MoS2/H-CSi and MoS2/H-CSi-H). Accordingly, p-n junctions can be generated in bilayer MoS2 if a fully hydrogenated monolayer SiC is inserted between the layers. In addition, the staggered band alignment of the top and bottom monolayers of MoS2 leads to considerable rectification of current. The results are helpful for the design of TMD based nanoelectronic devices.
机译:由于选择性掺杂的巨大挑战,难以在原子薄的过渡金属二甲硅藻(TMDS)中产生P-N结。作为界面诱导的电子掺杂的结果,第一原理计算证明单层MOS2中的电子状态可以通过与氢化SiC片的接触而基本上调谐。具体地,单层MOS2在与SiC-H(MOS2 / SiC-H)的Si终端接触时表现出金属特性,但是当与CSI-H的C终止接触时,展示Ambolar型偏振(MOS2 / CSI-H) 。此外,单层MOS2可以从H-Si终端(MOS2 / H-SiC和MOS2 / H-SiC-H)上的p型切换到HC终端上的n型(MOS2 / H-CSI和MOS2 / H-CSI -H)。因此,如果在层之间插入完全氢化的单层SiC,则可以在双层MOS2中产生P-N结。另外,MOS2的顶部和底部单层的交错带对准导致电流的相当大的整流。结果有助于设计TMD基纳米电子器件。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号