首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >High-performance organic/inorganic hybrid ultraviolet p-NiO/PVK/n-ZnO heterojunction photodiodes with a poly(N-vinylcarbazole) insertion layer
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High-performance organic/inorganic hybrid ultraviolet p-NiO/PVK/n-ZnO heterojunction photodiodes with a poly(N-vinylcarbazole) insertion layer

机译:高性能有机/无机杂交紫外线P-NIO / PVK / N- ZnO异质结光电二极管,具有聚(N-乙烯基咔唑)插入层

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In this study, an organic poly(N-vinylcarbazole) (PVK) layer was inserted between the p-NiO and n-ZnO inorganic layers and a p-NiO/PVK/n-ZnO organic/inorganic hybrid ultraviolet heterojunction photodiode (PD) was fabricated. The PD without the PVK insertion layer demonstrates poor rectifying behavior due to a large barrier existing at the p-NiO/n-ZnO interface. The p-NiO/n-ZnO interface has many defects, which causes a tunneling current, and thus linear current-voltage dependence. After inserting the PVK layer, the large barrier height at the p-NiO/n-ZnO interface was split into two small barriers; hence, the carriers can transport easily in the PD and possess superior rectifying characteristics. The visible-generated carriers created by the defects at the p-NiO/n-ZnO interface contribute to the visible response in the PD without PVK. However, the visible-generated carriers are trapped by PVK, reducing the visible response by approximately two orders. PVK has a strong absorption band between 320 and 350 nm, which greatly increases the UV response. Thus, the UV/visible rejection ratio enhances from 81 to 638, which is approximately 8 times that of the PD without PVK.
机译:在该研究中,在P-NiO和N- ZnO无机层之间插入有机聚(N-乙烯基咔唑)(PVK)层和P-NiO / PVK / N- ZnO有机/无机杂化紫外异质结光电二极管(PD)是制造的。没有PVK插入层的PD显示出由于P-NIO / N-ZnO接口存在的大屏障而呈现差的整流行为。 P-NIO / N-ZnO接口具有许多缺陷,导致隧道电流,从而导致线性电流电压依赖性。插入PVK层后,P-NIO / N-ZNO界面处的大屏障高度分为两个小屏障;因此,载体可以容易地在PD中运输并且具有优异的整流特性。由P-NIO / N-ZNO接口的缺陷创建的可见引起的载波有助于PD中的可见响应而没有PVK。然而,可见的载体被PVK捕获,减少了大约两个订单的可见响应。 PVK在320和350nm之间具有强大的吸收带,这大大增加了UV响应。因此,UV /可见抑制比增强了81至638,其没有PVK的PD大约8倍。

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