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首页> 外文期刊>JOM >Interconnect Fabrication on Polymer Substrate using Submicron/Nano Silver Particles with the Assistance of Low-Density Irradiations
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Interconnect Fabrication on Polymer Substrate using Submicron/Nano Silver Particles with the Assistance of Low-Density Irradiations

机译:使用亚微米/纳米银颗粒在低密度照射的辅助下互连在聚合物基板上

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Low-energy Xenon flash pulses permit sintering of spray-pyrolyzed submicron Ag particles (SMPs) into conductive tracks with acceptable electrical resistivity (16.7 mu omega cm) on polyimide film in several seconds without extra heating. Mixed with Ag nanoparticles (20% in weight ratio), the resistivity of the obtained sintered mixed pastes can be reduced to 12.6 mu omega cm, which is nearly the same as those formed using nanoparticle pastes (11.2 mu omega cm). Using irradiation on the polymer substrate side, more uniform sintered deposits with better electrical conductance (rho < 10 mu omega cm) and greater bending fatigue resistance could be achieved. This sheds light on a new method for preparing low-cost, bendable Ag interconnections.
机译:低能量氙闪光脉冲允许喷雾热解亚微粒Ag颗粒(SMP)烧结到几秒钟内具有可接受的电阻率(16.7μmomegacm)的导电轨道,在几秒钟内没有额外加热。 与Ag纳米颗粒(重量比为20%)混合,所得烧结混合浆料的电阻率可以降至12.6μmomegacm,与使用纳米颗粒糊剂(11.2μmomgacm)形成的那些几乎相同。 在聚合物基板侧使用辐射,可以实现更均匀的烧结沉积物(RHO <10μmωcm)和更大的弯曲疲劳抗性。 这揭示了一种新方法,用于准备低成本,可弯曲的AG互连。

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