The role of pressure on thin amorphous carbon films deposited using microwave surface wave plasma CVD

摘要

We report the effects of gas composition pressure (GCP) on the optical, structural and electrical properties of thin amorphous carbon (a-C) films grown on p-type silicon and quartz substrates by microwave surface wave plasma chemical vapor deposition (MW SWP CVD). The films, deposited at various GCPs ranging from 50 to 110 Pa, were studied by UV/VIS/NIR spectroscopy, atomic force microscopy, Raman spectroscopy, X-ray photoelectron spectroscopy and current-voltage characteristics. The optical band gap of the a-C film was tailored to a relatively high range, 2.3-2.6 eV by manipulating GCPs from 50 to 110 Pa. Also, spin density strongly depended on the band gap of the a-C films. Raman spectra showed qualitative structured changes due to sp~3/sp~2 carbon bonding network. The surfaces of the films are found to be veriy smooth and uniform (RMS roughness<0.5 nm). The photovoltaic measurements under light illumination (AM 1.5, 100 mW/crrr) show that short-circuit current density, open-circuit voltage, fill factor and photo-conversion efficiency of the film deposited at 50 Pa were 6.4 mu A/cm~2, 126 mV, 0.164 and 1.4 X 10~(-4) percent respectively.