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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Effect of of DC bias and RF self-bias on the structure and properties of chromium oxide coatings prepared by vacuum cathodic arc deposition
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Effect of of DC bias and RF self-bias on the structure and properties of chromium oxide coatings prepared by vacuum cathodic arc deposition

机译:DC偏差和RF自偏倚对真空阴极电弧沉积制备的氧化铬涂层结构与性能的影响

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摘要

Cr2O3 coatings were prepared by vacuum cathodic arc deposition (VCAD) on cemented carbide YT15 at different voltages of both direct current (DC) and radio frequency (RF) bias. The structure and properties of the coatings were investigated by scanning electron microscope, X-ray diffraction, and nanoindentation. With both DC and RF bias, coatings deposited at zero and low bias voltage exhibit a columnar structure and a preferred orientation (PO) of (104). As the bias voltage increases, the columnar structure starts to disappear and PO gradually becomes (006). Besides, the crystallite size of the coatings declines as the bias voltage increases. Comparing to DC bias, the RF bias leads to smaller crystallite size by virtue of higher energy and density of ion bombardment. The electrical resistivity of the coatings and saturation ion current density during deposition were measured to explain this effect. The hardness of the coatings was significantly enhanced by the bias voltage, particularly by the RF bias. A nano-hardness of 44.7 GPa was found in the coating deposited under - 100 V RF bias, which has not been previously reported.
机译:在直流(DC)和射频(RF)偏置的不同电压下,通过真空阴极电弧沉积(VCAD)在水泥碳化物YT15上制备CR2O3涂层。通过扫描电子显微镜,X射线衍射和纳米凸缘来研究涂层的结构和性质。通过DC和RF偏置,处于零和低偏置电压沉积的涂层表现出柱状结构和(104)的优选方向(PO)。随着偏置电压的增加,柱状结构开始消失,PO逐渐变为(006)。此外,随着偏置电压的增加,涂层的晶体尺寸下降。比较DC偏压,RF偏置凭借更高的能量和离子轰击密度导致较小的微晶尺寸。测量沉积期间涂层和饱和离子电流密度的电阻率以解释这种效果。通过偏置电压显着提高涂层的硬度,特别是通过RF偏置。在沉积的涂层中发现了44.7GPa的纳米硬度,其尚未报道。

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